SCHEMBL28832809

SCHEMBL28832809

[CH2]C(c1ccccc1)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.33
DPP4 P27487 2/20 0.32
TSHR P16473 2/20 0.32
F2 P00734 1/20 0.32
ALDH1A1 P00352 1/20 0.32
CES1 P23141 1/20 0.31
ACP3 P15309 1/20 0.31
ADRA2A P08913 1/20 0.30
ADRA2C P18825 1/20 0.30
LMNA P02545 1/20 0.30
HIF1A Q16665 1/20 0.30
TDP1 Q9NUW8 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30
KDM4E B2RXH2 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
PTPN1 P18031 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL197635 0.77 DPP4 (0.38) POLBDPP4TSHRF2ALDH1A1
SCHEMBL10040021 0.76 LMNA (0.43) TSHRALDH1A1CES1ADRA2AADRA2C
SCHEMBL7132919 0.70 AOC3 (0.41) POLBTSHRALDH1A1CES1ADRA2A
SCHEMBL48224 0.68 TSHR (0.41) POLBDPP4TSHRF2ALDH1A1
SCHEMBL596278 0.67 RIPK1 (0.40) DPP4TSHRF2L3MBTL1
SCHEMBL7623731 0.67 TSHR (0.43) DPP4TSHRF2ALDH1A1LMNA
SCHEMBL9297397 0.67 CES2 (0.38) POLBDPP4TSHRF2ALDH1A1
SCHEMBL7870015 0.65 POLB (0.39) POLBDPP4TSHRF2ALDH1A1
Biphenyl SCHEMBL5987825 0.65 MAPK1 (0.46) POLBTSHRALDH1A1CES1LMNA
SCHEMBL19637974 0.64 AOC3 (0.40) TSHRALDH1A1CES1ADRA2AADRA2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110437046-A Polymer containing fluorine atom and its utilize technical field NISSAN CHEMICAL IND LTD 2019-11-12 CN disclosed
CN-107406584-A Fluorine atom-containing polymer and field of use thereof 日产化学工业株式会社 2017-11-28 CN disclosed
CN-105764885-A Acid- and radical-generating agent and method for generating acid and radical 和光纯药工业株式会社 2016-07-13 CN disclosed