SCHEMBL2883450

SCHEMBL2883450

CCCc1ccc(-c2cc(F)c(C=O)c(F)c2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RARB P10826 4/20 0.44
RARA P10276 1/20 0.44
RARG P13631 1/20 0.44
MCL1 Q07820 1/20 0.42
CA2 P00918 1/20 0.40
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
TP53 P04637 1/20 0.38
PKM P14618 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
HSD17B10 Q99714 1/20 0.38
MAOB P27338 1/20 0.37
THRB P10828 2/20 0.37
MAPT P10636 1/20 0.36
GFER P55789 1/20 0.36
CYP17A1 P05093 1/20 0.36
CYP11B1 P15538 1/20 0.36
CYP11B2 P19099 1/20 0.36
TAAR1 Q96RJ0 1/20 0.36
GPR84 Q9NQS5 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL503169 0.90 RARB (0.43) RARBRARARARGMCL1CA2
SCHEMBL6519497 0.89 RARB (0.58) RARBRARARARGCA2TP53
SCHEMBL502476 0.82 RARB (0.47) RARBRARARARGMCL1NPC1
SCHEMBL6409307 0.81 RARB (0.43) RARBRARARARGMCL1CA2
SCHEMBL9764255 0.80 RARB (0.46) RARBRARARARGMCL1CA2
SCHEMBL16258127 0.80 RARB (0.46) RARBRARARARGMCL1CA2
SCHEMBL14525745 0.80 RARB (0.46) RARBRARARARGMCL1CA2
SCHEMBL10030242 0.79 RARB (0.54) RARBRARARARGCA2HSD17B10
SCHEMBL16080727 0.79 RARB (0.45) RARBRARARARGMCL1CA2
SCHEMBL19844721 0.79 RARB (0.45) RARBRARARARGMCL1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8916718-B2 Compound having 2-fluorophenyloxymethane structure DIC CORPORATION (JP) 2014-12-23 US disclosed
US-8916718-B2 Compound having 2-fluorophenyloxymethane structure DIC CORPORATION (JP) 2014-12-23 US disclosed
US-20140275577-A1 COMPOUND HAVING 2-FLUOROPHENYLOXYMETHANE STRUCTURE DIC CORPORATION (JP) 2014-09-18 US disclosed
US-20140275577-A1 COMPOUND HAVING 2-FLUOROPHENYLOXYMETHANE STRUCTURE DIC CORPORATION (JP) 2014-09-18 US disclosed
EP-2123623-B1 LIQUID CRYSTALLINE COMPOUND, LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL DISPLAY ELEMENT JNC CORP (JP) 2013-08-07 EP disclosed
US-7846514-B2 Liquid crystal compound, liquid crystal composition and, liquid crystal display device CHISSO CORPORATION (JP) 2010-12-07 US disclosed
US-7846514-B2 Liquid crystal compound, liquid crystal composition and, liquid crystal display device CHISSO CORPORATION (JP) 2010-12-07 US disclosed
US-7846514-B2 Liquid crystal compound, liquid crystal composition and, liquid crystal display device CHISSO CORPORATION (JP) 2010-12-07 US disclosed
US-20100073621-A1 LIQUID CRYSTALLINE COMPOUND, LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL DISPLAY ELEMENT CHISSO CORPORATION (JP) 2010-03-25 US disclosed
US-20100073621-A1 LIQUID CRYSTALLINE COMPOUND, LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL DISPLAY ELEMENT CHISSO CORPORATION (JP) 2010-03-25 US disclosed
US-20100073621-A1 LIQUID CRYSTALLINE COMPOUND, LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL DISPLAY ELEMENT CHISSO CORPORATION (JP) 2010-03-25 US disclosed
EP-2123623-A1 LIQUID CRYSTALLINE COMPOUND, LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL DISPLAY ELEMENT Chisso Corporation (JP) 2009-11-25 EP disclosed
EP-2123623-A1 LIQUID CRYSTALLINE COMPOUND, LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL DISPLAY ELEMENT Chisso Corporation (JP) 2009-11-25 EP disclosed
US-6864397-B2 Difluoromethyl ether derivative and process for producing the same CHISSO CORPORATION (JP) 2005-03-08 US disclosed
US-6827876-B2 Using alpha, alpha -difluorocyclohexylidene derivative as starting material to obtain difluoromethyl ether derivative CHISSO CORPORATION (JP) 2004-12-07 US disclosed
US-20040016906-A1 Difluoromethyl ether derivative and process for producing the same JNC CORPORATION (JP) 2004-01-29 US disclosed
US-20040004207-A1 Difluoromethyl ether derivative and process for producing the same JNC CORPORATION (JP) 2004-01-08 US disclosed
US-6605747-B2 Reacting the starting material, an alpha , alpha -difluorocyclohexylidene derivative with a halogen to produce an intermediate, reacting the intermediate with a phenol compound in presence of a base CHISSO CORPORATION (JP) 2003-08-12 US disclosed
US-20020120168-A1 Difluoromethyl ether derivative and process for producing the same JNC PETROCHEMICAL CORPORATION (JP) 2002-08-29 US disclosed
EP-1182186-A2 Difluoromethyl ether derivative and process for producing the same CHISSO CORPORATION (JP) 2002-02-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040004207-A1 Difluoromethyl ether derivative and process for producing the same RCC1, PYM1, SCFD1 RARB 3277/4885RARA 2698/4885RARG 3554/4885
US-20140275577-A1 COMPOUND HAVING 2-FLUOROPHENYLOXYMETHANE STRUCTURE PIK3CD, TEC, PIK3C3 RARB 4494/4885RARA 3939/4885RARG 4409/4885
US-20100073621-A1 LIQUID CRYSTALLINE COMPOUND, LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL DISPLAY ELEMENT TRPV4, TRPV5, ZKSCAN2 RARB 2425/4885RARA 2650/4885RARG 3171/4885
US-20040016906-A1 Difluoromethyl ether derivative and process for producing the same RCC1, SCFD1, AFF1 RARB 3298/4885RARA 2721/4885RARG 3614/4885
US-20020120168-A1 Difluoromethyl ether derivative and process for producing the same LEF1, AFF1, RCC1 RARB 2584/4885RARA 2060/4885RARG 2720/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.