Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.53 |
| ▸ | MEN1 | O00255 | 2/20 | 0.53 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.49 |
| ▸ | ACHE | P22303 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | CEL | P19835 | 2/20 | 0.44 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | KDM1A | O60341 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7441223 | 0.85 | ALDH1A1 (0.55) | ALDH1A1KDM4EMEN1KMT2ATSHR | |
| SCHEMBL1733071 | 0.80 | CEL (0.51) | TSHRL3MBTL1CELSIGMAR1KDM1A | |
| SCHEMBL8549307 | 0.78 | ALDH1A1 (0.50) | ALDH1A1KDM4EMEN1KMT2ATSHR | |
| Carbamic Acid SCHEMBL16174715 | 0.78 | ALDH1A1 (0.57) | ALDH1A1KDM4EMEN1KMT2ATSHR | |
| SCHEMBL12219085 | 0.77 | ALDH1A1 (0.67) | ALDH1A1KDM4EMEN1KMT2ATSHR | |
| SCHEMBL3202573 | 0.76 | ALDH1A1 (0.72) | ALDH1A1MEN1KMT2ATSHRL3MBTL1 | |
| SCHEMBL16191584 | 0.76 | CEL (0.49) | ALDH1A1KMT2AL3MBTL1HPGDCEL | |
| SCHEMBL6424070 | 0.75 | ALDH1A1 (0.54) | ALDH1A1KDM4EMEN1KMT2ATSHR | |
| SCHEMBL11779612 | 0.75 | ALDH1A1 (0.87) | ALDH1A1KDM4EMEN1KMT2ATSHR | |
| SCHEMBL1732699 | 0.74 | CEL (0.46) | ALDH1A1TSHRL3MBTL1ACHECEL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115244465-A | Negative photosensitive resin composition, pattern structure, and method for producing pattern cured film | 中央硝子株式会社 | 2022-10-25 | — | — | CN | disclosed |