SCHEMBL28899400

SCHEMBL28899400

OCCOCCOc1ccc(-c2cccc3c2Cc2ccccc2-3)cc1OCCOCCO

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5AP P20292 2/20 0.37
FEN1 P39748 2/20 0.37
AR P10275 2/20 0.37
PNMT P11086 1/20 0.36
KDM4E B2RXH2 6/20 0.36
ALDH1A1 P00352 5/20 0.36
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
MAPT P10636 1/20 0.35
MAPK1 P28482 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
ADRB2 P07550 1/20 0.34
ADRB1 P08588 1/20 0.34
KCNH2 Q12809 1/20 0.34
TMEM97 Q5BJF2 1/20 0.34
SIGMAR1 Q99720 1/20 0.34
LMNA P02545 2/20 0.33
HTT P42858 1/20 0.33
IDO1 P14902 1/20 0.33
TDP1 Q9NUW8 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28614106 0.88 PNMT (0.36) ALOX5APFEN1ARPNMTKDM4E
SCHEMBL28472166 0.86 PNMT (0.38) PNMTKDM4EALDH1A1MEN1KMT2A
SCHEMBL28479326 0.85 L3MBTL1 (0.43) PNMTKDM4EALDH1A1MEN1KMT2A
SCHEMBL577450 0.84 SLC6A9 (0.45) ALOX5APFEN1ARPNMTKDM4E
SCHEMBL28980774 0.84 IDO1 (0.41) ALOX5APFEN1ARPNMTKDM4E
SCHEMBL28479052 0.84 KDM4E (0.46) PNMTKDM4EALDH1A1MAPTMAPK1
SCHEMBL577513 0.83 TLR8 (0.39) ALOX5APFEN1ARPNMTMEN1
SCHEMBL28469158 0.83 ALDH1A1 (0.38) PNMTKDM4EALDH1A1MAPTMAPK1
SCHEMBL28479536 0.81 ALDH1A1 (0.46) PNMTKDM4EALDH1A1MEN1KMT2A
SCHEMBL576515 0.81 RARA (0.40) ALOX5APFEN1ARPNMTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111742246-B Antireflection film and multilayer film having antireflection film 三菱瓦斯化学株式会社 2022-06-17 CN disclosed
CN-113574420-A Laminate for antireflection film, and method for producing laminate for antireflection film 三菱瓦斯化学株式会社 2021-10-29 CN disclosed
CN-113302035-A Antireflection film and multilayer film having antireflection film 三菱瓦斯化学株式会社 2021-08-24 CN disclosed
CN-111742246-A Antireflection film and multilayer film having antireflection film 三菱瓦斯化学株式会社 2020-10-02 CN disclosed