SCHEMBL2890447

SCHEMBL2890447

Cc1cc(C(c2ccc(Oc3ccc(N)cc3)c(C)c2)(C(F)(F)F)C(F)(F)F)ccc1Oc1ccc(N)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 3/20 0.47
L3MBTL1 Q9Y468 3/20 0.47
MAPT P10636 7/20 0.46
ALDH1A1 P00352 7/20 0.46
NPC1 O15118 2/20 0.46
HPGD P15428 1/20 0.46
MAPK1 P28482 1/20 0.46
LMNA P02545 1/20 0.43
ATM Q13315 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
FFAR1 O14842 1/20 0.42
TEAD4 Q15561 1/20 0.42
TDP1 Q9NUW8 2/20 0.41
POLB P06746 1/20 0.41
CYP3A4 P08684 1/20 0.39
TSHR P16473 1/20 0.39
HTR2A P28223 1/20 0.39
SLC6A4 P31645 1/20 0.39
KCNH2 Q12809 1/20 0.39
NPSR1 Q6W5P4 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8762382 0.93 MAPT (0.46) RAB9AL3MBTL1MAPTALDH1A1NPC1
SCHEMBL2997814 0.92 RAB9A (0.46) RAB9AL3MBTL1MAPTALDH1A1NPC1
SCHEMBL11082712 0.87 ALDH1A1 (0.42) RAB9AL3MBTL1MAPTALDH1A1NPC1
SCHEMBL27714446 0.86 L3MBTL1 (0.59) RAB9AL3MBTL1MAPTALDH1A1NPC1
SCHEMBL30172875 0.83 RAB9A (0.42) RAB9AL3MBTL1MAPTALDH1A1NPC1
SCHEMBL10713698 0.83 PDE7A (0.50) RAB9AL3MBTL1MAPTALDH1A1NPC1
SCHEMBL28639356 0.83 RAB9A (0.42) RAB9AL3MBTL1MAPTALDH1A1NPC1
SCHEMBL10714102 0.83 RAB9A (0.42) RAB9AL3MBTL1MAPTALDH1A1NPC1
SCHEMBL10715671 0.82 MAPT (0.46) RAB9AL3MBTL1MAPTALDH1A1NPC1
SCHEMBL10711920 0.82 MAPT (0.43) RAB9AL3MBTL1MAPTALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US claimed
US-9487726-B2 Imide compound, method for producing same, thickening agent for grease, and grease composition JX NIPPON OIL & ENERGY CORPORATION (JP) 2016-11-08 US disclosed
US-8765867-B2 Heat-resistant resin paste and method for producing same HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-07-01 US disclosed
US-8759440-B2 Heat-resistant resin paste HITACHI CHEMICAL COMPANY, LTD. (JP) 2014-06-24 US disclosed
US-20130345102-A1 IMIDE COMPOUND, METHOD FOR PRODUCING SAME, THICKENING AGENT FOR GREASE, AND GREASE COMPOSITION JX NIPPON OIL & ENERGY CORPORATION (JP) 2013-12-26 US disclosed
US-20100285292-A1 Aromatic Polyimide Film and Process for the Production Thereof TEIJIN LIMITED (JP) 2010-11-11 US disclosed
US-20090264582-A1 HEAT-RESISTANT RESIN PASTE HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-10-22 US disclosed
US-7560307-B2 Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-07-14 US disclosed
EP-2055747-A1 HEAT-RESISTANT RESIN PASTE Hitachi Chemical Co., Ltd. (JP) 2009-05-06 EP disclosed
US-20090088536-A1 HEAT-RESISTANT RESIN PASTE AND METHOD FOR PRODUCING SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2009-04-02 US disclosed
US-5037862-A Excellent mechanical stability in printing HITACHI CHEMICAL COMPANY, LTD. (JP) 1991-08-06 US disclosed
US-4954612-A ORIENTATION CONTROL FOR LIQUID CRYSTAL DISPLAY HITACHI CHEMICAL CO., LTD. (JP) 1990-09-04 US disclosed
EP-0336536-A2 Organic-solvent soluble polyimide and production thereof Hitachi Chemical Co., Ltd. (JP) 1989-10-11 EP disclosed
US-4791157-A REACTING TRIMELLITIC ACID WITH AROMATIC DIAMINE WITH ETHER GROUPS HITACHI CHEMICAL CO. (JP) 1988-12-13 US disclosed
US-4758875-A Resin encapsulated semiconductor device HITACHI, LTD. (JP) 1988-07-19 US disclosed
EP-0032745-B1 ETHER IMIDES AND PROCESS FOR PRODUCING THE SAME Hitachi, Ltd. (JP) 1987-01-07 EP disclosed
EP-0047530-B1 MALEIMIDE RESIN COMPOSITION AND PROCESS FOR ITS PRODUCTION Hitachi, Ltd. (JP) 1986-12-10 EP disclosed
US-4435560-A HEAT RESISTANT, GOOD PROCESSABILITY HITACHI, LTD. (JP) 1984-03-06 US disclosed
EP-0047530-A2 Maleimide resin composition and process for its production Hitachi, Ltd. (JP) 1982-03-17 EP disclosed
EP-0032745-A2 Ether imides and process for producing the same Hitachi, Ltd. (JP) 1981-07-29 EP disclosed