Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL28965607

COC(=O)Oc1ccc(O[SH](C)(=O)O)cc1.O=S(=O)(O)C(F)(F)F

nearest known ligand 0.37

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MMP2 P08253 1/20 0.37
▸ MMP9 P14780 1/20 0.37
▸ MMP14 P50281 1/20 0.37
▸ KMT2A Q03164 2/20 0.34
▸ MEN1 O00255 1/20 0.34
▸ CXCR2 P25025 2/20 0.33
▸ ELANE P08246 4/20 0.32
▸ MAPT P10636 2/20 0.32
▸ ALDH1A1 P00352 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ HTT P42858 1/20 0.32
▸ HSD17B10 Q99714 1/20 0.32
▸ POLB P06746 1/20 0.31
▸ PKM P14618 1/20 0.31
▸ ACR P10323 1/20 0.31
▸ PRTN3 P24158 1/20 0.31
▸ MAPK1 P28482 1/20 0.31
▸ SMN1; SMN2 Q16637 1/20 0.31
▸ CXCR1 P25024 1/20 0.30
▸ MMP1 P03956 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL28964426 0.81 GAA (0.38) KMT2AMEN1ELANEALDH1A1LMNA
Trifluoromethanesulfonic Acid SCHEMBL30273412 0.79 CTRB1 (0.35) MMP2MMP9MMP14KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL20421987 0.71 HTT (0.44) MAPTLMNAHTT
SCHEMBL676909 0.71 KMT2A (0.58) MMP2MMP9MMP14KMT2AMEN1
Trifluoromethanesulfonic Acid SCHEMBL29634745 0.69 PPARG (0.48) KMT2AMEN1CXCR2ALDH1A1LMNA
SCHEMBL697018 0.69 KIF11 (0.56) KMT2AMEN1ALDH1A1LMNAACR
Trifluoromethanesulfonic Acid SCHEMBL4168987 0.68 MMP2 (0.40) MMP2MMP9MMP14KMT2AMEN1
SCHEMBL12273951 0.68 MMP2 (0.43) MMP2MMP9MMP14KMT2AMEN1
SCHEMBL12658710 0.67 PKM (0.66) MMP2MMP9MMP14KMT2AMEN1
SCHEMBL16395041 0.66 ESR1 (0.44) MMP2MMP9MMP14KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115768832-A Resin composition, method for producing same, and method for producing composition for pattern formation 富士胶片株式会社 2023-03-07 — — CN disclosed
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