Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP2 | P08253 | 1/20 | 0.40 |
| ▸ | MMP9 | P14780 | 1/20 | 0.40 |
| ▸ | MMP14 | P50281 | 1/20 | 0.40 |
| ▸ | ELANE | P08246 | 5/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | CXCR2 | P25025 | 1/20 | 0.34 |
| ▸ | PRTN3 | P24158 | 1/20 | 0.33 |
| ▸ | CNR1 | P21554 | 1/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 2/20 | 0.32 |
| ▸ | MMP13 | P45452 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29634757 | 0.88 | MMP2 (0.44) | MMP2MMP9MMP14ELANEKMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL4175814 | 0.85 | MAPT (0.51) | ELANEKMT2AMAPTPOLBPKM | |
| SCHEMBL6561499 | 0.84 | KMT2A (0.46) | MMP2MMP9MMP14ELANEKMT2A | |
| Trifluoromethanesulfonic Acid SCHEMBL31564959 | 0.82 | SRD5A1 (0.41) | ELANEKMT2AMAPTPOLBPKM | |
| SCHEMBL31038957 | 0.82 | MMP9 (0.42) | MMP2MMP9MMP14MAPTPOLB | |
| Trifluoromethanesulfonic Acid SCHEMBL30925711 | 0.82 | THRB (0.42) | MMP2MMP9ELANEMAPTPOLB | |
| Trifluoromethanesulfonic Acid SCHEMBL5146818 | 0.82 | KCNH2 (0.46) | MMP2MMP9KMT2APKMKCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL4178807 | 0.81 | MMP2 (0.37) | MMP2MMP9MMP14CNR1ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL31564995 | 0.81 | ELANE (0.43) | ELANEKMT2AMAPTPOLBPKM | |
| Trifluoromethanesulfonic Acid SCHEMBL30536267 | 0.77 | KIF11 (0.43) | MMP2MMP9MMP14ACHEALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12434998-B2 | Resin-coated ultra-thin glass | TORAY INDUSTRIES, INC. (JP) | 2025-10-07 | — | — | US | disclosed |
| CN-114730132-B | Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin | 富士胶片株式会社 | 2025-05-09 | — | — | CN | disclosed |
| CN-116648353-B | Resin coated ultra-thin plate glass and display device | 东丽株式会社 | 2025-01-21 | — | — | CN | disclosed |
| CN-114761466-B | Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin | 富士胶片株式会社 | 2024-12-10 | — | — | CN | disclosed |
| CN-114008527-B | Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and polyimide or polyimide precursor | 富士胶片株式会社 | 2024-11-01 | — | — | CN | disclosed |
| US-20230365458-A1 | RESIN-COATED ULTRA-THIN GLASS | TORAY INDUSTRIES, INC. (JP) | 2023-11-16 | — | — | US | disclosed |
| CN-115867866-A | Method for producing cured product, resin composition, developer, method for producing laminate, and method for producing semiconductor device | 富士胶片株式会社 | 2023-03-28 | — | — | CN | disclosed |
| CN-115768832-A | Resin composition, method for producing same, and method for producing composition for pattern formation | 富士胶片株式会社 | 2023-03-07 | — | — | CN | disclosed |
| CN-115190891-A | Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-115103871-A | Resin composition, cured film, laminate, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2022-09-23 | — | — | CN | disclosed |
| CN-114761466-A | Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin | 富士胶片株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114730132-A | Curable resin composition, cured film, laminate, method for producing cured film, semiconductor device, and resin | 富士胶片株式会社 | 2022-07-08 | — | — | CN | disclosed |
| CN-108700836-B | Method for manufacturing laminate and method for manufacturing semiconductor device | 富士胶片株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-112368336-A | Resin composition and cured film thereof | 东丽株式会社 | 2021-02-12 | — | — | CN | disclosed |
| CN-108026253-B | Polymer compound and method for producing same, resin composition, film, solid-state imaging device and method for producing same, and optical device | 东丽株式会社 | 2020-06-12 | — | — | CN | disclosed |
| WO-2020045214-A1 | RESIN COMPOSITION AND CURED FILM OBTAINED THEREFROM | 東レ株式会社 | 2020-03-05 | — | — | WO | disclosed |
| EP-1942150-B1 | SILOXANE RESIN COMPOSITION AND METHOD FOR PRODUCING SAME | TORAY INDUSTRIES (JP) | 2018-08-22 | — | — | EP | disclosed |
| US-20120237873-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM FORMED FROM THE SAME, AND DEVICE HAVING CURED FILM | TORAY INDUSTRIES INC. (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20090105360-A1 | SILOXANE RESIN COMPOSITION AND PRODUCTION METHOD THEREOF | TORAY INDUSTRIES, INC. (JP) | 2009-04-23 | — | — | US | disclosed |
| EP-1942150-A1 | SILOXANE RESIN COMPOSITION AND METHOD FOR PRODUCING SAME | TORAY INDUSTRIES, INC. (JP) | 2008-07-09 | — | — | EP | disclosed |