Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 6/20 | 0.39 |
| ▸ | CA1 | P00915 | 4/20 | 0.39 |
| ▸ | CA9 | Q16790 | 4/20 | 0.39 |
| ▸ | CA5A | P35218 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA3 | P07451 | 1/20 | 0.32 |
| ▸ | CA6 | P23280 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.32 |
| ▸ | TLR9 | Q9NR96 | 1/20 | 0.31 |
| ▸ | BCHE | P06276 | 2/20 | 0.31 |
| ▸ | ACHE | P22303 | 2/20 | 0.31 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | MEN1 | O00255 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.31 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL504035 | 0.83 | SOS1 (0.32) | CA2CA1MMP2 | |
| SCHEMBL36178 | 0.82 | CA2 (0.36) | CA2CA1CA9CA5AALDH1A1 | |
| SCHEMBL5477402 | 0.82 | PKM (0.41) | CA2CA1CA9GAACA12 | |
| SCHEMBL36628 | 0.82 | CA1 (0.40) | CA2CA1CA9SMN1; SMN2HTT | |
| SCHEMBL2895496 | 0.82 | CA2 (0.38) | CA2CA1CA9CA5AGAA | |
| SCHEMBL1805125 | 0.81 | CYP3A4 (0.34) | CA2CA1CA9CA5AGAA | |
| SCHEMBL548507 | 0.81 | CA1 (0.42) | CA2CA1CA9ALDH1A1KMT2A | |
| SCHEMBL5707356 | 0.81 | EPAS1 (0.34) | PTGS1PTGS2 | |
| SCHEMBL3762396 | 0.81 | TSHR (0.43) | CA2CA1CA9CA5AGAA | |
| SCHEMBL2903906 | 0.81 | TDP1 (0.34) | ALDH1A1PTGS1PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1253470-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2010-06-16 | — | — | EP | disclosed |
| EP-1238972-B1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR CORP (JP) | 2009-12-16 | — | — | EP | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |
| EP-1640804-B1 | Positive-tone radiation-sensitive resin composition | JSR CORP (JP) | 2008-11-19 | — | — | EP | disclosed |
| US-20080070998-A1 | Foam Production Method | OJI PAPER CO., LTD. (JP) | 2008-03-20 | — | — | US | disclosed |
| US-7335457-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| US-7258962-B2 | Positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-21 | — | — | US | disclosed |
| EP-1795553-A1 | PROCESS FOR PRODUCING FOAM | Oji Paper Co., Ltd. (JP) | 2007-06-13 | — | — | EP | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |
| EP-0813521-B1 | ENERGY-ACTIVATABLE SALTS WITH FLUOROCARBON ANIONS | MINNESOTA MINING & MFG (US) | 2000-09-13 | — | — | EP | disclosed |
| WO-2000020925-A2 | SILICON-CONTAINING ALCOHOLS AND POLYMERS HAVING SILICON-CONTAINING TERTIARY ESTER GROUPS MADE THEREFROM | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2000-04-13 | — | — | WO | disclosed |
| WO-2000011520-A1 | POLYMERS HAVING SILICON-CONTAINING ACETAL OR KETAL FUNCTIONAL GROUPS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2000-03-02 | — | — | WO | disclosed |
| EP-0693468-B1 | A method of making Diaryliodonium fluoroalkyl sulphonate salts | MINNESOTA MINING & MFG (US) | 1999-06-09 | — | — | EP | disclosed |
| US-5747622-A | PHOTORESISTS AND SILICONE RESINS | NEC CORPORATION (JP) | 1998-05-05 | — | — | US | disclosed |
| US-5710320-A | Diaryliodonium fluoroalkyl sulfonate salts and a method of making | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-01-20 | — | — | US | disclosed |
| EP-0813521-A1 | ENERGY-ACTIVATABLE SALTS WITH FLUOROCARBON ANIONS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-12-29 | — | — | EP | disclosed |
| WO-1996027584-A1 | ENERGY-ACTIVATABLE SALTS WITH FLUOROCARBON ANIONS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-09-12 | — | — | WO | disclosed |
| US-5488147-A | Diaryliodonium fluoroalkyl sulfonate salts and a method of making | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-01-30 | — | — | US | disclosed |
| EP-0693468-A2 | Diaryliodonium fluoroalkyl sulphonate salts and a method of making them | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-01-24 | — | — | EP | disclosed |