Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | CA9 | Q16790 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.36 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.34 |
| ▸ | NPC1 | O15118 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.34 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | RORA | P35398 | 1/20 | 0.34 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1270050 | 0.95 | HSD11B1 (0.39) | CA1CA2CA9ALDH1A1HSD11B1 | |
| SCHEMBL3828157 | 0.87 | CA1 (0.38) | CA1CA2CA9ALDH1A1HSD11B1 | |
| SCHEMBL3174085 | 0.87 | CA1 (0.38) | CA1CA2CA9ALDH1A1HSD11B1 | |
| SCHEMBL548507 | 0.86 | CA1 (0.42) | CA1CA2CA9ALDH1A1HSD11B1 | |
| SCHEMBL3762396 | 0.85 | TSHR (0.43) | CA1CA2CA9ALDH1A1HSD11B1 | |
| SCHEMBL565631 | 0.83 | ALDH1A1 (0.36) | CA1CA2CA9ALDH1A1MAPT | |
| SCHEMBL114860 | 0.83 | CA1 (0.36) | CA1CA2CA9ALDH1A1MAPT | |
| SCHEMBL2898700 | 0.82 | CA2 (0.39) | CA1CA2CA9ALDH1A1SMN1; SMN2 | |
| SCHEMBL448975 | 0.82 | CA2 (0.37) | CA1CA2CA9ALDH1A1RORA | |
| SCHEMBL3090902 | 0.82 | CA2 (0.37) | CA1CA2CA9ALDH1A1RORA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2728 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250021002-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | CHINA ADVANCED LITHOGRAPHIC MATERIAL TECHNOLOGY CO. LTD. (CN) | 2025-01-16 | — | — | US | claimed |
| US-11675269-B2 | Composition for forming resist overlayer film for EUV lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-06-13 | — | — | US | claimed |
| WO-2023082371-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | 上海新阳半导体材料股份有限公司 | 2023-05-19 | — | — | WO | claimed |
| EP-2326744-B1 | METAL COMPOSITIONS AND METHODS OF MAKING SAME | PRYOG LLC (US) | 2022-06-01 | — | — | EP | claimed |
| US-10961342-B2 | Resin formulation and uses thereof | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2021-03-30 | — | — | US | claimed |
| US-10723823-B2 | Resin formulation and uses thereof | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2020-07-28 | — | — | US | claimed |
| US-20200087443-A1 | A Resin Formulation and Uses Thereof | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2020-03-19 | — | — | US | claimed |
| US-20180273657-A1 | RESIN FORMULATION AND USES THEREOF | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2018-09-27 | — | — | US | claimed |
| WO-2018117974-A1 | A CURABLE COATING COMPOSITION AND METHOD OF PREPARING A COATING FILM | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2018-06-28 | — | — | WO | claimed |
| WO-2018080397-A1 | A RESIN FORMULATION AND USES THEREOF | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2018-05-03 | — | — | WO | claimed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | claimed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | claimed |
| EP-0679951-B1 | Positive resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 1997-01-15 | — | — | EP | claimed |
| EP-0679951-A1 | Positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-11-02 | — | — | EP | claimed |
| US-5256510-A | Usable with laser diodes | EASTMAN KODAK COMPANY (US) | 1993-10-26 | — | — | US | claimed |
| EP-0557501-A1 | OPTICAL RECORDING WITH NEAR-INFRARED DYES TO EFFECT BLEACHING | EASTMAN KODAK COMPANY (US) | 1993-09-01 | — | — | EP | claimed |
| US-5221591-A | Photoelectrographic imaging with a multi-active element containing near-infrared sensitizing pigments | EASTMAN KODAK COMPANY (US) | 1993-06-22 | — | — | US | claimed |
| WO-1993006597-A1 | OPTICAL RECORDING WITH NEAR-INFRARED DYES TO EFFECT BLEACHING | EASTMAN KODAK COMPANY (US) | 1993-04-01 | — | — | WO | claimed |
| US-5055439-A | PHOTOACID GENERATING COMPOSITION AND SENSITIZER THEREFOR | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1991-10-08 | — | — | US | claimed |
| EP-0435531-A2 | Photoacid generating composition and sensitizer therefor | International Business Machines Corporation (US) | 1991-07-03 | — | — | EP | claimed |