Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 3/20 | 0.41 |
| ▸ | CA1 | P00915 | 5/20 | 0.39 |
| ▸ | CA2 | P00918 | 5/20 | 0.39 |
| ▸ | CA9 | Q16790 | 2/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA7 | P43166 | 1/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.38 |
| ▸ | NOX4 | Q9NPH5 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.36 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.36 |
| ▸ | SLC22A12 | Q96S37 | 1/20 | 0.36 |
| ▸ | MMP2 | P08253 | 2/20 | 0.36 |
| ▸ | MMP1 | P03956 | 1/20 | 0.36 |
| ▸ | MMP9 | P14780 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL361657 | 0.95 | KMT2A (0.40) | PKMCA1CA2CA9HSD11B1 | |
| SCHEMBL2898700 | 0.82 | CA2 (0.39) | CA1CA2CA9CA12CA7 | |
| SCHEMBL2922354 | 0.82 | CA2 (0.37) | PKMCA1CA2CA9HSD11B1 | |
| SCHEMBL1804139 | 0.81 | GAA (0.35) | PKMCA1CA2HSD11B1GAA | |
| SCHEMBL1800748 | 0.80 | CA1 (0.34) | PKMCA1CA2HSD11B1GAA | |
| SCHEMBL504035 | 0.80 | SOS1 (0.32) | PKMCA1CA2HSD11B1MMP2 | |
| SCHEMBL64775 | 0.80 | PPARA (0.32) | KMT2A | |
| SCHEMBL36178 | 0.80 | CA2 (0.36) | CA1CA2CA9ALDH1A1 | |
| SCHEMBL36628 | 0.79 | CA1 (0.40) | CA1CA2CA9HSD11B1MAPK1 | |
| SCHEMBL548507 | 0.79 | CA1 (0.42) | CA1CA2CA9HSD11B1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070122744-A1 | Positive-working photoresist composition and photosensitive material using same | MAEMORI SATOSHI | 2007-05-31 | — | — | US | disclosed |
| US-20050037291-A1 | Method for forming fine resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-02-17 | — | — | US | disclosed |
| US-6818380-B2 | DECREASING NUMBER OF DEFECTS BY USING PHOTORESIST OF AQUEOUS SOLUTION OF TETRAMETHYLAMMONIUM HYDROXIDE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-11-16 | — | — | US | disclosed |
| US-6777158-B2 | OCCURRENCE OF DEFECTS IN THE PATTERNED RESIST LAYER CAN BE GREATLY SUPPRESSED RESULTING IN INCREASED RELIABILITY OF THE SEMICONDUCTOR DEVICES AND PRODUCTIVITY THEREOF. | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-08-17 | — | — | US | disclosed |
| US-20040072103-A1 | Positive-working photoresist composition | SATO KAZUFUMI (JP) | 2004-04-15 | — | — | US | disclosed |
| US-20040067615-A1 | Method for the preparation of a semiconductor device | MAEMORI SATOSHI (JP) | 2004-04-08 | — | — | US | disclosed |
| US-6677103-B2 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| US-6444394-B1 | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-09-03 | — | — | US | disclosed |
| US-20020110750-A1 | Positive-working photoresist composition | SATO KAZUFUMI (JP) | 2002-08-15 | — | — | US | disclosed |
| US-20020106580-A1 | Method for forming a hole-patterned photoresist layer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-08-08 | — | — | US | disclosed |
| US-20020058202-A1 | Positive-working photoresist composition and photosensitive material using same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-05-16 | — | — | US | disclosed |
| US-20020045133-A1 | Method for the preparation of a semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-04-18 | — | — | US | disclosed |