SCHEMBL5707356

SCHEMBL5707356

Cc1cc(C)cc([I+](OS(=O)(=O)C(F)(F)F)c2cc(C)cc(C)c2)c1

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
EPAS1 Q99814 1/20 0.34
PTGS1 P23219 1/20 0.30
PTGS2 P35354 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2898700 0.81 CA2 (0.39) PTGS1PTGS2
SCHEMBL2903906 0.77 TDP1 (0.34) PTGS1PTGS2
SCHEMBL36178 0.75 CA2 (0.36)
SCHEMBL28751819 0.72 EPAS1 (0.37) EPAS1PTGS1PTGS2
SCHEMBL4430441 0.72 EPAS1 (0.44) EPAS1
SCHEMBL504035 0.72 SOS1 (0.32)
SCHEMBL5477402 0.71 PKM (0.41) PTGS1PTGS2
SCHEMBL36628 0.71 CA1 (0.40)
SCHEMBL1805125 0.70 CYP3A4 (0.34) EPAS1PTGS1PTGS2
SCHEMBL548507 0.70 CA1 (0.42) PTGS1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1011029-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-08-30 EP disclosed
US-6337171-B1 AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS JSR CORPORATION (JP) 2002-01-08 US disclosed
EP-1011029-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2000-06-21 EP disclosed