SCHEMBL28991408

SCHEMBL28991408

CC1(C)c2ccccc2-c2ccc(Sc3ccc(Sc4ccc5c(c4)C(C)(C)c4ccccc4-5)cc3)cc21

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOA P21397 4/20 0.42
▸ MAOB P27338 4/20 0.42
▸ CYP26A1 O43174 1/20 0.37
▸ BCL2 P10415 2/20 0.37
▸ MCL1 Q07820 2/20 0.37
▸ RARB P10826 1/20 0.36
▸ RARG P13631 1/20 0.36
▸ RXRA P19793 1/20 0.36
▸ RXRB P28702 1/20 0.36
▸ RXRG P48443 1/20 0.36
▸ MLNR O43193 1/20 0.36
▸ NR1I2 O75469 1/20 0.36
▸ CHRM2 P08172 1/20 0.36
▸ ADRB1 P08588 1/20 0.36
▸ HTR1A P08908 1/20 0.36
▸ ADRA2A P08913 1/20 0.36
▸ CHRM1 P11229 1/20 0.36
▸ DRD2 P14416 1/20 0.36
▸ ADRA2B P18089 1/20 0.36
▸ ADRA2C P18825 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29591921 0.96 MAOA (0.47) MAOAMAOBCYP26A1BCL2MCL1
SCHEMBL23581585 0.91 MAOA (0.36) MAOAMAOBCYP26A1BCL2MCL1
SCHEMBL29822905 0.85 MAOA (0.36) MAOAMAOBCYP26A1BCL2MCL1
SCHEMBL20865459 0.85 NOX1 (0.37) MLNRNR1I2CHRM2ADRB1HTR1A
SCHEMBL23591870 0.84 MAOA (0.35) MAOAMAOBCYP26A1BCL2MCL1
SCHEMBL21551909 0.83 PDK2 (0.52) MAOAMAOBCYP26A1MLNRNR1I2
SCHEMBL20845203 0.82 LMNA (0.35) MAOAMAOBMLNRNR1I2CHRM2
SCHEMBL20222301 0.82 AR (0.31) MLNRNR1I2CHRM2ADRB1HTR1A
SCHEMBL14499257 0.82 MAOA (0.39) MAOAMAOBBCL2MCL1MLNR
SCHEMBL20198312 0.81 MAOA (0.44) MAOAMAOBBCL2MCL1RARB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114868081-A Photosensitive resin composition, dry film and method for producing same, resist film, substrate with mold, and method for producing plated molded article 东京应化工业株式会社 2022-08-05 — — CN disclosed
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