Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 2/20 | 0.36 |
| ▸ | MAOB | P27338 | 2/20 | 0.36 |
| ▸ | CYP26A1 | O43174 | 1/20 | 0.33 |
| ▸ | RARB | P10826 | 1/20 | 0.32 |
| ▸ | RARG | P13631 | 1/20 | 0.32 |
| ▸ | RXRA | P19793 | 1/20 | 0.32 |
| ▸ | RXRB | P28702 | 1/20 | 0.32 |
| ▸ | RXRG | P48443 | 1/20 | 0.32 |
| ▸ | BCL2 | P10415 | 1/20 | 0.32 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29591921 | 0.85 | MAOA (0.47) | MAOAMAOBCYP26A1RARBRARG | |
| SCHEMBL28991408 | 0.85 | MAOA (0.42) | MAOAMAOBCYP26A1RARBRARG | |
| SCHEMBL23581585 | 0.77 | MAOA (0.36) | MAOAMAOBCYP26A1RARBRARG | |
| SCHEMBL23591870 | 0.75 | MAOA (0.35) | MAOAMAOBCYP26A1RARBRARG | |
| SCHEMBL29593444 | 0.74 | PGR (0.33) | — | |
| SCHEMBL14499257 | 0.73 | MAOA (0.39) | MAOAMAOBBCL2MCL1ALDH1A1 | |
| SCHEMBL20865459 | 0.73 | NOX1 (0.37) | — | |
| SCHEMBL92199 | 0.72 | HPGD (0.45) | MAOAMAOBBCL2MCL1ALDH1A1 | |
| SCHEMBL21551909 | 0.71 | PDK2 (0.52) | MAOAMAOBCYP26A1 | |
| SCHEMBL20845203 | 0.70 | LMNA (0.35) | MAOAMAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114868081-A | Photosensitive resin composition, dry film and method for producing same, resist film, substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2022-08-05 | — | — | CN | disclosed |