Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 8/20 | 0.72 |
| ▸ | MEN1 | O00255 | 5/20 | 0.72 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.69 |
| ▸ | MAPT | P10636 | 10/20 | 0.69 |
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.69 |
| ▸ | HPGD | P15428 | 7/20 | 0.69 |
| ▸ | VDR | P11473 | 2/20 | 0.68 |
| ▸ | F2 | P00734 | 5/20 | 0.61 |
| ▸ | HTT | P42858 | 4/20 | 0.55 |
| ▸ | LMNA | P02545 | 3/20 | 0.51 |
| ▸ | THRB | P10828 | 1/20 | 0.51 |
| ▸ | XBP1 | P17861 | 2/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | MASP2 | O00187 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547931 | 0.88 | KDM4E (0.71) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL6743844 | 0.87 | KDM4E (0.62) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL2903856 | 0.84 | KDM4E (0.51) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL2468373 | 0.84 | KMT2A (1.00) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL3823140 | 0.84 | KMT2A (0.51) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL3824343 | 0.84 | KMT2A (0.51) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL547930 | 0.82 | KMT2A (0.50) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL64368 | 0.82 | KDM4E (1.00) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL64277 | 0.81 | VDR (1.00) | KMT2AMEN1KDM4EMAPTALDH1A1 | |
| SCHEMBL29370293 | 0.81 | VDR (1.00) | KMT2AMEN1KDM4EMAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104662049-B | Photocurable composition and method for producing film using same | 佳能株式会社 | 2020-06-02 | — | — | CN | disclosed |
| CN-109964327-B | Field-effect transistor, method for manufacturing same, wireless communication device using same, and commodity label | 东丽株式会社 | 2020-05-19 | — | — | CN | disclosed |
| CN-104698756-B | Positive photosensitive resin composition, pattern forming method, thin film transistor array substrate and liquid crystal display device | 奇美实业股份有限公司 | 2019-03-22 | — | — | CN | disclosed |
| US-9448474-B2 | Positive photosensitive resin composition and pattern forming method | CHI MEI CORPORATION (TW) | 2016-09-20 | — | — | US | disclosed |
| US-20150160554-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, THIN FILM TRANSISTOR ARRAY SUBSTRATE, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2015-06-11 | — | — | US | disclosed |
| CN-104698756-A | Positive photosensitive resin composition, pattern forming method, thin film transistor array substrate and liquid crystal display device | CHI MEI CORP | 2015-06-10 | — | — | CN | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| EP-1253470-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-10-30 | — | — | EP | disclosed |
| EP-1238972-A1 | Novel carbazole derivative and chemically amplified radiation-sensitive resin composition | JSR Corporation (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |