SCHEMBL29083527

SCHEMBL29083527

CCC(C)(C)Oc1ccccc1.CCC(C)(C)Oc1ccccc1C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ DRD2 P14416 1/20 0.40
▸ DRD4 P21917 1/20 0.40
▸ RIPK1 Q13546 1/20 0.38
▸ L3MBTL1 Q9Y468 2/20 0.36
▸ NPSR1 Q6W5P4 1/20 0.36
▸ SCN4A P35499 2/20 0.36
▸ TSHR P16473 3/20 0.34
▸ KMT2A Q03164 2/20 0.34
▸ MEN1 O00255 1/20 0.34
▸ NPC1 O15118 1/20 0.34
▸ RAB9A P51151 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34
▸ ALDH1A1 P00352 1/20 0.34
▸ GLA P06280 1/20 0.34
▸ CYP1A2 P05177 4/20 0.33
▸ RXRA P19793 1/20 0.33
▸ RXRB P28702 1/20 0.33
▸ RXRG P48443 1/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ NOTUM Q6P988 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17929073 0.91 TSHR (0.39) DRD2DRD4SCN4ATSHRKMT2A
SCHEMBL183720 0.85 LTA4H (0.40) RIPK1L3MBTL1NPSR1TSHRALDH1A1
SCHEMBL13969481 0.78 LTA4H (0.53) RIPK1TSHRNPC1RAB9ALMNA
Acetic Acid SCHEMBL28684431 0.77 PPARG (0.42) RIPK1L3MBTL1NPSR1KMT2AMEN1
SCHEMBL11780418 0.76 DRD2 (0.41) DRD2DRD4RIPK1SCN4ATSHR
SCHEMBL15341309 0.75 VDR (0.36) KDM4E
SCHEMBL133972 0.74 TSHR (0.41) TSHRKMT2AMEN1NPC1RAB9A
SCHEMBL29690507 0.74 TSHR (0.38) DRD2DRD4RIPK1SCN4ATSHR
SCHEMBL6825891 0.72 SCN4A (0.39) DRD2DRD4SCN4ATSHRKMT2A
SCHEMBL9757873 0.72 CA12 (0.43) L3MBTL1ALDH1A1RXRARXRBRXRG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116670108-A Ether compounds as volatiles for treating amino acid based substrates such as skin and hair 迈图高新材料有限责任公司 2023-08-29 — — CN claimed
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