Ethane

Ethane

SCHEMBL29138437

CC.O=C(Cl)c1cc(C(=O)Cl)cc(C(=O)Cl)c1

nearest known ligand 0.37

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.37
TSHR P16473 2/20 0.37
GLRA1 P23415 1/20 0.35
HDAC8 Q9BY41 2/20 0.34
TPMT P51580 2/20 0.33
CA5A P35218 1/20 0.33
ATM Q13315 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
TTR P02766 1/20 0.31
NR4A1 P22736 1/20 0.30
HDAC6 Q9UBN7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL38576 0.93 ALDH1A1 (0.40) ALDH1A1TSHRGLRA1HDAC8TPMT
Acetone SCHEMBL28498158 0.90 LMNA (0.38) ALDH1A1TSHRGLRA1HDAC8TPMT
Hydrochloric Acid SCHEMBL18918955 0.90 ALDH1A1 (0.39) ALDH1A1TSHRGLRA1HDAC8TPMT
Benzene SCHEMBL28576976 0.87 TDP1 (0.43) ALDH1A1TSHRGLRA1TPMTCA5A
SCHEMBL29201943 0.87 ALDH1A1 (0.37) ALDH1A1TSHRGLRA1HDAC8TPMT
SCHEMBL10041772 0.85 CA5A (0.52) ALDH1A1TSHRCA5AL3MBTL1
SCHEMBL4623865 0.85 CA5A (0.52) ALDH1A1TSHRCA5AL3MBTL1
SCHEMBL4360630 0.85 TPMT (0.52) ALDH1A1HDAC8TPMTATMHDAC6
SCHEMBL1962624 0.84 TDP1 (0.42) ALDH1A1TSHRATMTDP1L3MBTL1
SCHEMBL8060297 0.84 ALDH1A1 (0.36) ALDH1A1TSHRGLRA1TPMTATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117244414-B Preparation method for preparing separation membrane by utilizing radiation curing to realize rapid drying 苏州苏瑞膜纳米科技有限公司 2024-05-17 CN disclosed
CN-117244414-A Preparation method for preparing separation membrane by utilizing radiation curing to realize rapid drying 苏州苏瑞膜纳米科技有限公司 2023-12-19 CN disclosed