SCHEMBL29139982

SCHEMBL29139982

CCN(CC)CCC[SiH](C)CCCN(CC)CC

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 2/20 0.34
SLC2A1 P11166 1/20 0.33
NPSR1 Q6W5P4 1/20 0.32
CHRM2 P08172 1/20 0.32
HTR1A P08908 1/20 0.32
ADRA2A P08913 1/20 0.32
CHRM1 P11229 1/20 0.32
DRD1 P21728 1/20 0.32
SLC6A2 P23975 1/20 0.32
SLC6A4 P31645 1/20 0.32
ADRA1A P35348 1/20 0.32
OPRM1 P35372 1/20 0.32
DRD3 P35462 1/20 0.32
SLC6A3 Q01959 1/20 0.32
KCNH2 Q12809 1/20 0.32
PAOX Q6QHF9 1/20 0.31
ALDH1A1 P00352 1/20 0.31
HRH4 Q9H3N8 1/20 0.31
HRH3 Q9Y5N1 1/20 0.31
ACHE P22303 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21409761 0.83 SIGMAR1 (0.34) SIGMAR1SLC2A1NPSR1CHRM2HTR1A
SCHEMBL2102240 0.76 SIGMAR1 (0.33) SIGMAR1SLC2A1NPSR1CHRM2HTR1A
SCHEMBL235041 0.75 SIGMAR1 (0.42) SIGMAR1SLC2A1NPSR1CHRM2HTR1A
SCHEMBL234338 0.75 SIGMAR1 (0.48) SIGMAR1SLC2A1NPSR1CHRM2HTR1A
SCHEMBL15052279 0.75 SIGMAR1 (0.48) SIGMAR1SLC2A1NPSR1CHRM2HTR1A
SCHEMBL25224116 0.74 SIGMAR1 (0.36) SIGMAR1SLC2A1NPSR1SLC6A2SLC6A4
SCHEMBL2102046 0.74 SIGMAR1 (0.32) SIGMAR1SLC2A1NPSR1CHRM2HTR1A
SCHEMBL23282519 0.72 ALDH1A1 (0.34) SIGMAR1SLC2A1ALDH1A1
SCHEMBL2269180 0.72 SIGMAR1 (0.35) SIGMAR1SLC2A1KCNH2ALDH1A1HRH4
SCHEMBL2101921 0.72 PAOX (0.32) SIGMAR1SLC2A1PAOXALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117377716-A Organosilicon pressure-sensitive adhesive and method for preparing same 迈图高新材料公司 2024-01-09 CN disclosed