Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.39 |
| ▸ | RAB9A | P51151 | 3/20 | 0.39 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | CNR2 | P34972 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | CASP3 | P42574 | 1/20 | 0.37 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.37 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.37 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | HRH3 | Q9Y5N1 | 11/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL5175328 | 0.87 | NPC1 (0.47) | NPC1RAB9APOLBCYP2C9CNR2 | |
| SCHEMBL244418 | 0.87 | NPC1 (0.47) | NPC1RAB9APOLBCYP2C9CNR2 | |
| Sulfuric Acid SCHEMBL2920580 | 0.84 | NPC1 (0.39) | NPC1RAB9APOLBCYP2C9CNR2 | |
| Sulfuric Acid SCHEMBL2920577 | 0.84 | NPC1 (0.41) | NPC1RAB9APOLBCYP2C9CNR2 | |
| Sulfuric Acid SCHEMBL4384843 | 0.84 | NPC1 (0.41) | NPC1RAB9APOLBCYP2C9CNR2 | |
| SCHEMBL7455424 | 0.82 | NPC1 (0.36) | NPC1RAB9APOLBCYP2C9CNR2 | |
| Acetic Acid SCHEMBL548374 | 0.81 | HDAC1 (0.44) | NPC1RAB9APOLBCYP2C9MAPT | |
| SCHEMBL10123416 | 0.81 | NPC1 (0.43) | NPC1RAB9ACNR2MAPTMAPK1 | |
| SCHEMBL4389991 | 0.77 | NPC1 (0.34) | NPC1RAB9APOLBCYP2C9CNR2 | |
| SCHEMBL4624075 | 0.76 | NPC1 (0.44) | NPC1RAB9APOLBCYP2C9MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| EP-1656590-A2 | NOVEL PHOTOSENSITIVE BILAYER COMPOSITION | FujiFilm Electronic Materials USA, Inc. (US) | 2006-05-17 | — | — | EP | disclosed |
| US-6887647-B2 | Negative-working resist composition for electron beams or x-rays | FUJI PHOTO FILM CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| WO-2005022257-A2 | NOVEL PHOTOSENSITIVE BILAYER COMPOSITION | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-03-10 | — | — | WO | disclosed |
| EP-1467251-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2004-10-13 | — | — | EP | disclosed |
| US-20040197702-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2004-10-07 | — | — | US | disclosed |
| US-20020192592-A1 | Negative-working resist composition for electron beams or X-rays | FUJI PHOTO FILM CO., LTD. | 2002-12-19 | — | — | US | disclosed |