Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.39 |
| ▸ | RAB9A | P51151 | 3/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | CASP3 | P42574 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.39 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.39 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.39 |
| ▸ | CNR2 | P34972 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | HRH3 | Q9Y5N1 | 9/20 | 0.37 |
| ▸ | MAOB | P27338 | 3/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | DRD3 | P35462 | 2/20 | 0.35 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.35 |
| ▸ | SHBG | P04278 | 1/20 | 0.35 |
| ▸ | DRD2 | P14416 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL2920577 | 0.93 | NPC1 (0.41) | NPC1RAB9ALMNAMAPK1CASP3 | |
| Sulfuric Acid SCHEMBL4384843 | 0.93 | NPC1 (0.41) | NPC1RAB9ALMNAMAPK1CASP3 | |
| SCHEMBL244418 | 0.85 | NPC1 (0.47) | NPC1RAB9ALMNAMAPK1CASP3 | |
| Iodide SCHEMBL5175328 | 0.85 | NPC1 (0.47) | NPC1RAB9ALMNAMAPK1CASP3 | |
| Acetic Acid SCHEMBL2914240 | 0.84 | NPC1 (0.39) | NPC1RAB9ALMNAMAPK1CASP3 | |
| SCHEMBL4624075 | 0.84 | NPC1 (0.44) | NPC1RAB9AMAPTHRH3MAOB | |
| SCHEMBL4868297 | 0.83 | LMNA (0.39) | NPC1RAB9ALMNAMAPK1CASP3 | |
| SCHEMBL3753445 | 0.83 | LMNA (0.39) | NPC1RAB9ALMNAMAPK1CASP3 | |
| SCHEMBL4623961 | 0.83 | HRH3 (0.41) | NPC1RAB9ALMNAMAPK1CASP3 | |
| Sulfuric Acid SCHEMBL482028 | 0.82 | ALDH1A1 (0.48) | NPC1RAB9ALMNAMAPK1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2477073-A1 | Resist composition for electron beam, EUV or X-ray | Fujifilm Corporation (JP) | 2012-07-18 | — | — | EP | disclosed |
| EP-1467251-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-09-08 | — | — | EP | disclosed |
| US-7521168-B2 | Compound that has a reduction potential higher than that of diphenyl iodonium salt and generates an acid upon irradiation of an actinic ray or radiation. | FUJIFILM CORPORATION (JP) | 2009-04-21 | — | — | US | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7361446-B2 | Sensitivity, high resolution, good pattern profile, used for super-microlithography | FUJIFILM CORPORATION (JP) | 2008-04-22 | — | — | US | disclosed |
| EP-1203659-B1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2006-05-17 | — | — | EP | disclosed |
| EP-1241002-B1 | Planographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2006-02-08 | — | — | EP | disclosed |
| EP-1602481-A1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2005-12-07 | — | — | EP | disclosed |
| US-6939658-B2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-06 | — | — | US | disclosed |
| US-6887647-B2 | Negative-working resist composition for electron beams or x-rays | FUJI PHOTO FILM CO., LTD. (JP) | 2005-05-03 | — | — | US | disclosed |
| US-20020136980-A1 | Positive resist composition to be irradiated with one of an electron beam and X-ray | FUJI PHOTO FILM CO., LTD. | 2002-09-26 | — | — | US | disclosed |
| EP-1241002-A2 | Planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-09-18 | — | — | EP | disclosed |
| US-6410204-B1 | CONTAINING ACID GENERATOR | FUJI PHOTO FILM CO., LTD. (JP) | 2002-06-25 | — | — | US | disclosed |
| US-20020068241-A1 | Lithographic printing plate precursor | FUJIFILM CORPORATION (JP) | 2002-06-06 | — | — | US | disclosed |
| US-20020058206-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| EP-1203659-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-05-08 | — | — | EP | disclosed |
| EP-1193556-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2002-04-03 | — | — | EP | disclosed |
| US-20020015916-A1 | POSITIVE RESIST COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 2002-02-07 | — | — | US | disclosed |
| US-20010036590-A1 | Chemical amplification type negative-working resist composition for electron beams or X-rays | FUJIFILM CORPORATION (JP) | 2001-11-01 | — | — | US | disclosed |
| EP-1109066-A1 | Chemical amplification type negative-working resist composition for electron beams or x-rays | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-20 | — | — | EP | disclosed |