Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.47 |
| ▸ | RAB9A | P51151 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | CNR2 | P34972 | 2/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | CASP3 | P42574 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.40 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.40 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.40 |
| ▸ | HRH3 | Q9Y5N1 | 12/20 | 0.38 |
| ▸ | MAOB | P27338 | 8/20 | 0.38 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
| ▸ | DRD3 | P35462 | 1/20 | 0.36 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL5175328 | 1.00 | NPC1 (0.47) | NPC1RAB9AMAPTCNR2LMNA | |
| SCHEMBL10123416 | 0.94 | NPC1 (0.43) | NPC1RAB9AMAPTCNR2LMNA | |
| SCHEMBL30370226 | 0.92 | NPC1 (0.42) | NPC1RAB9AMAPTCNR2LMNA | |
| Sulfuric Acid SCHEMBL4384843 | 0.88 | NPC1 (0.41) | NPC1RAB9AMAPTCNR2LMNA | |
| Sulfuric Acid SCHEMBL2920577 | 0.88 | NPC1 (0.41) | NPC1RAB9AMAPTCNR2LMNA | |
| Acetic Acid SCHEMBL2914240 | 0.87 | NPC1 (0.39) | NPC1RAB9AMAPTCNR2LMNA | |
| Sulfuric Acid SCHEMBL2920580 | 0.85 | NPC1 (0.39) | NPC1RAB9AMAPTCNR2LMNA | |
| SCHEMBL779443 | 0.84 | NPC1 (0.58) | NPC1RAB9AMAPTCNR2LMNA | |
| SCHEMBL4624075 | 0.80 | NPC1 (0.44) | NPC1RAB9AMAPTHRH3MAOB | |
| SCHEMBL4623961 | 0.79 | HRH3 (0.41) | NPC1RAB9AMAPTLMNAMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 419 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9221928-B2 | Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-12-29 | — | — | US | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-2362268-B1 | Polymer, chemically amplified positive resist compositions and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2013-01-23 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| US-12585186-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-30 | — | — | US | disclosed |
| CN-116954024-A | Chemically amplified positive resist composition and method for forming resist pattern | 信越化学工业株式会社 | 2023-10-27 | — | — | CN | disclosed |
| US-20230314943-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR MANUFACTURING RESIST FILM USING THE SAME | MERCK PATENT GMBH (DE) | 2023-10-05 | — | — | US | disclosed |
| CN-110531580-B | Chemically amplified negative resist composition and resist pattern forming method | 信越化学工业株式会社 | 2023-08-29 | — | — | CN | disclosed |
| CN-111665684-B | Positive resist composition and pattern forming method | 信越化学工业株式会社 | 2023-08-25 | — | — | CN | disclosed |
| US-20230213858-A1 | MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| US-20040245432-A1 | Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method | FUJI PHOTO FILM CO., LTD. | 2004-12-09 | — | — | US | disclosed |
| US-20040053158-A1 | Onium salts and the use therof as latent acids | CIBA SPECIALTY CHEMICALS CORP. | 2004-03-18 | — | — | US | disclosed |
| EP-1344109-A2 | ONIUM SALTS AND THE USE THEROF AS LATENT ACIDS | Ciba SC Holding AG (CH) | 2003-09-17 | — | — | EP | disclosed |
| WO-2002046507-A2 | ONIUM SALTS AND THE USE THEROF AS LATENT ACIDS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2002-06-13 | — | — | WO | disclosed |
| US-5585425-A | Thermochromic opaque/transparent composition, laminate member employing the same, and three-dimensional member employing said laminate member and capable of concealing and revealing the interior | THE PILOT INK CO., LTD. (JP) | 1996-12-17 | — | — | US | disclosed |
| US-5490956-A | Thermochromic opaque composition, laminate member employing the same, and three-dimensional member employing said laminate member and capable of concealing and revealing the interior | PILOT INK CO., LTD. (JP) | 1996-02-13 | — | — | US | disclosed |
| EP-0677564-A2 | Opaque/transparent thermochromic compositions and laminate | THE PILOT INK CO., LTD. (JP) | 1995-10-18 | — | — | EP | disclosed |
| EP-0595577-A2 | Thermochromic opaque composition and uses thereof | THE PILOT INK CO., LTD. (JP) | 1994-05-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12585186-B2 | Photoacid generator, chemically amplified resist composition, and patterning process | LBR, LIFR, LEF1 | NPC1 3652/4885RAB9A 2589/4885MAPT 4757/4885 |
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | INSR, INSRR, SLC6A5 | NPC1 3749/4885RAB9A 3054/4885MAPT 714/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.