SCHEMBL2915787

SCHEMBL2915787

COC(CCCNCc1ccccc1)OC

nearest known ligand 0.58

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MAOA P21397 1/20 0.58
CHRM2 P08172 2/20 0.56
MEN1 O00255 2/20 0.53
KMT2A Q03164 2/20 0.53
TDP1 Q9NUW8 1/20 0.53
SIGMAR1 Q99720 3/20 0.53
SCN8A Q9UQD0 1/20 0.50
GAA P10253 1/20 0.47
MAPT P10636 1/20 0.47
DRD4 P21917 1/20 0.46
BCHE P06276 2/20 0.45
MPO P05164 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28667301 0.92 MAOA (0.62) MAOACHRM2MEN1KMT2ATDP1
SCHEMBL5547201 0.89 MEN1 (0.57) MAOACHRM2MEN1KMT2ATDP1
SCHEMBL20850656 0.80 MAOA (0.64) MAOACHRM2MEN1KMT2ATDP1
SCHEMBL3168512 0.78 MEN1 (0.50) MAOACHRM2MEN1KMT2ATDP1
SCHEMBL22306916 0.77 DRD4 (0.51) MAOACHRM2MEN1KMT2ATDP1
SCHEMBL4932707 0.77 MAOA (0.95) MAOACHRM2MEN1KMT2ATDP1
SCHEMBL893154 0.77 MAOA (0.86) MAOACHRM2MEN1KMT2ATDP1
SCHEMBL7316643 0.77 MAOA (0.64) MAOACHRM2MEN1KMT2ATDP1
SCHEMBL18768836 0.76 ALOX15 (0.51) MEN1KMT2ASIGMAR1
SCHEMBL6327377 0.76 MEN1 (0.73) CHRM2MEN1KMT2ABCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1349005-B1 Photosensitive compound, resin and composition TOYO GOSEI CO LTD (JP) 2010-09-01 EP disclosed
EP-1128214-B1 Photosensitive compound and photosensitive resin TOYO GOSEI KOGYO KK (JP) 2009-11-04 EP disclosed
US-6861456-B2 Photosensitive compound, photosensitive resin, and photosensitive composition TOYO GOSEI KOGYO CO., LTD. (JP) 2005-03-01 US disclosed
US-20040266901-A1 NOVEL PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION TOYO GOSEI KOGYO CO., LTD. (JP) 2004-12-30 US disclosed
EP-1349005-A1 Photosensitive compound, resin and composition Toyo Gosei Kogyo Co., Ltd. (JP) 2003-10-01 EP disclosed
US-6610791-B2 Substituted thiazole derivative; for use in color cathode ray tubes, display tubes, screen printing TOYO GOSAI KOGYO CO., LTD. (JP) 2003-08-26 US disclosed
US-20010047068-A1 Photosensitive compound and photosensitive resin TOYO GOSEI KOGYO CO., LTD. (JP) 2001-11-29 US disclosed
EP-1128214-A1 Photosensitive compound and photosensitive resin Toyo Gosei Kogyo Co., Ltd. (JP) 2001-08-29 EP disclosed