Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.61 |
| ▸ | TSHR | P16473 | 1/20 | 0.61 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.57 |
| ▸ | TRIM24 | O15164 | 1/20 | 0.46 |
| ▸ | TRIM33 | Q9UPN9 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 5/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.44 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | CA4 | P22748 | 1/20 | 0.44 |
| ▸ | CA12 | O43570 | 4/20 | 0.41 |
| ▸ | CA9 | Q16790 | 3/20 | 0.41 |
| ▸ | CDK4 | P11802 | 1/20 | 0.41 |
| ▸ | CCND1 | P24385 | 1/20 | 0.41 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | JUN | P05412 | 1/20 | 0.41 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzene SCHEMBL23581564 | 0.91 | TRIM24 (0.54) | ALDH1A1TSHRTRPA1TRIM24TRIM33 | |
| SCHEMBL20076 | 0.89 | — | — | |
| SCHEMBL29511549 | 0.89 | — | — | |
| 4-Vinylphenol SCHEMBL6684751 | 0.88 | ALDH1A1 (0.44) | ALDH1A1TSHRTRPA1TRIM24TRIM33 | |
| SCHEMBL6122881 | 0.86 | TRIM24 (0.54) | ALDH1A1TRPA1TRIM24TRIM33CA2 | |
| Methane SCHEMBL2951846 | 0.86 | TRIM24 (0.54) | ALDH1A1TRPA1TRIM24TRIM33CA2 | |
| Styrene SCHEMBL29129764 | 0.86 | ALDH1A1 (0.74) | ALDH1A1TSHRTRPA1CA2NFKB1 | |
| Bromide SCHEMBL2361069 | 0.86 | TRIM24 (0.54) | ALDH1A1TRPA1TRIM24TRIM33CA2 | |
| Fluoride SCHEMBL2197395 | 0.86 | TRIM24 (0.54) | ALDH1A1TRPA1TRIM24TRIM33CA2 | |
| Styrene SCHEMBL6319042 | 0.85 | NFE2L2 (0.51) | ALDH1A1TSHRTRPA1CA2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110117404-B | Resin composition, and prepreg, metal foil laminate and printed wiring board produced using the same | 台燿科技股份有限公司 | 2021-12-07 | — | — | CN | claimed |
| EP-4127039-B1 | HIGH DARKNESS AND HIGH GLOSS DIMENSIONALLY STABLE THERMOPLASTIC SMMA MOLDING COMPOSITION | INEOS STYROLUTION GROUP GMBH (DE) | 2024-11-20 | — | — | EP | disclosed |
| EP-4251696-B1 | UV RESISTANT SMMA COPOLYMERS WITH LOW HAZE AND HIGH CLARITY | INEOS STYROLUTION GROUP GMBH (DE) | 2024-11-20 | — | — | EP | disclosed |
| US-20240317968-A1 | HIGH CLARITY AND LOW HAZE UV STABILIZED STYRENE AND METHYL METHACRYLATE COPOLYMERS | INEOS STYROLUTION GROUP GMBH (DE) | 2024-09-26 | — | — | US | disclosed |
| US-20240010825-A1 | UV RESISTANT SMMA COPOLYMERS WITH LOW HAZE AND HIGH CLARITY | INEOS STYROLUTION GROUP GMBH (DE) | 2024-01-11 | — | — | US | disclosed |
| EP-4251696-A1 | UV RESISTANT SMMA COPOLYMERS WITH LOW HAZE AND HIGH CLARITY | INEOS Styrolution Group GmbH (DE) | 2023-10-04 | — | — | EP | disclosed |
| WO-2023127692-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-07-06 | — | — | WO | disclosed |
| US-20230183404-A1 | HIGH DARKNESS AND HIGH GLOSS DIMENSIONALLY STABLE THERMOPLASTIC SMMA MOLDING COMPOSITION | INEOS STYROLUTION GROUP GMBH (DE) | 2023-06-15 | — | — | US | disclosed |
| CN-115992351-A | Surface treatment agent for metal material, metal material having surface treatment film, and method for producing same | 日本帕卡濑精株式会社 | 2023-04-21 | — | — | CN | disclosed |
| WO-2023041512-A1 | HIGH CLARITY AND LOW HAZE UV STABILIZED STYRENE AND METHYL METHACRYLATE COPOLYMERS | INEOS STYROLUTION GROUP GMBH (DE) | 2023-03-23 | — | — | WO | disclosed |
| US-20040131967-A1 | Image forming composition and photosensitive lithographic plate using same | OKAMOTO CHEMICAL INDUSTRY CO., LTD. | 2004-07-08 | — | — | US | disclosed |
| US-6107425-A | FREE RADICAL POLYMERIZATION OF VINYL PHENOL MONOMERS O-PROTECTED BY AN ACID HYDROLYZABLE GROUP IN PRESENCE OF POLYMERIZATION CONTROL AGENT WITHOUT ADDING SEPARATE INITIATOR | SHIPLEY COMPANY, L.L.C. (US) | 2000-08-22 | — | — | US | disclosed |
| US-5955241-A | Chemical-amplification-type negative resist composition and method for forming negative resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-21 | — | — | US | disclosed |
| US-5302662-A | Polyamides, polyethers, polystyrene, polycarbonates, and polymethyl vinyl ether and compatibilizer comprising styrene-vinylphenol copolymer; mechanical properties | EASTMAN KODAK COMPANY (US) | 1994-04-12 | — | — | US | disclosed |
| US-5276089-A | Polystyrene, polyphenylene oxide blends with polyesters | EASTMAN KODAK COMPANY (US) | 1994-01-04 | — | — | US | disclosed |
| EP-0294109-B1 | DYESHEETS | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1993-03-10 | — | — | EP | disclosed |
| EP-0530648-A2 | Compatible polyester blends | EASTMAN CHEMICAL COMPANY (US) | 1993-03-10 | — | — | EP | disclosed |
| EP-0474927-A1 | Dynamically vulcanized alloys adherent to styrene copolymers and polyester compositions | ADVANCED ELASTOMER SYSTEMS, L.P. (US) | 1992-03-18 | — | — | EP | disclosed |
| US-4920092-A | POLYMER BACKBONE BONDED TO A STRUCTURE OF THERMALLY TRANSFER-ABLE DYE MOLECULES | IMPERIAL CHEMICAL INDUSTRICES PLC (GB) | 1990-04-24 | — | — | US | disclosed |
| EP-0294109-A2 | Dyesheets | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1988-12-07 | — | — | EP | disclosed |