SCHEMBL29319558

SCHEMBL29319558

O=C(O)c1ccc(COc2c(I)cc(I)cc2I)cc1

nearest known ligand 0.62

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
RXRA P19793 8/20 0.62
RXRB P28702 7/20 0.62
NR4A2 P43354 4/20 0.50
SMN1; SMN2 Q16637 3/20 0.50
NPC1 O15118 3/20 0.50
RAB9A P51151 3/20 0.50
POLB P06746 1/20 0.50
NR4A1 P22736 1/20 0.50
NR4A3 Q92570 1/20 0.50
RXRG P48443 3/20 0.49
MRGPRX4 Q96LA9 1/20 0.49
TSHR P16473 1/20 0.49
HPGD P15428 2/20 0.48
FOLH1 Q04609 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4265171 0.87 RXRA (0.62) RXRARXRBNR4A2SMN1; SMN2NPC1
SCHEMBL4269670 0.82 MEN1 (0.63) RXRARXRBNR4A2SMN1; SMN2NR4A1
SCHEMBL6720945 0.81 NR4A2 (0.59) RXRARXRBNR4A2
SCHEMBL6731785 0.81 NR4A2 (0.59) RXRARXRBNR4A2SMN1; SMN2NPC1
SCHEMBL4278599 0.81 THRA (0.50) RXRARXRBSMN1; SMN2NPC1RAB9A
SCHEMBL4274343 0.81 RXRA (0.59) RXRARXRBMRGPRX4
SCHEMBL6725240 0.81 RXRA (0.51) RXRARXRBFOLH1
SCHEMBL6724981 0.81 SRD5A2 (0.49) RXRARXRBNR4A2SMN1; SMN2RAB9A
SCHEMBL5014148 0.78 RXRA (0.62) RXRARXRBNR4A2SMN1; SMN2NPC1
SCHEMBL4265195 0.78 KDM5A (0.49) RXRARXRBRAB9AMRGPRX4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed