SCHEMBL29323835

SCHEMBL29323835

C=Cc1ccc(C(=O)OC(CS(=O)(=O)C(C)C)CS(=O)(=O)C(C)C)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 2/20 0.40
TAS1R1 Q7RTX1 2/20 0.40
CA12 O43570 2/20 0.37
CA1 P00915 2/20 0.37
CA2 P00918 2/20 0.37
CA7 P43166 2/20 0.37
CA9 Q16790 2/20 0.37
CA14 Q9ULX7 2/20 0.37
ALDH1A1 P00352 2/20 0.37
CYP4F2 P78329 1/20 0.36
CYP4A11 Q02928 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
ADRB2 P07550 1/20 0.35
ADRB1 P08588 1/20 0.35
ADRB3 P13945 1/20 0.35
PDCD1 Q15116 1/20 0.35
CD274 Q9NZQ7 1/20 0.35
GRIA4 P48058 2/20 0.35
SNCA P37840 1/20 0.33
PTPN1 P18031 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29323813 0.78 POLB (0.40) CA12CA9TDP1PDCD1CD274
SCHEMBL29323852 0.77 CA2 (0.41) TAS1R3TAS1R1CA12CA1CA2
SCHEMBL29030418 0.77 CA12 (0.47) TAS1R3TAS1R1CA12CA1CA2
SCHEMBL821210 0.77 CA12 (0.61) TAS1R3TAS1R1CA12CA1CA2
SCHEMBL29323853 0.76 TDP1 (0.39) CA1CA2CA9TDP1ADRB2
SCHEMBL12922588 0.75 TAS1R3 (0.47) TAS1R3TAS1R1CA12CA1CA2
SCHEMBL26861547 0.74 CA1 (0.54) TAS1R3TAS1R1CA12CA1CA2
SCHEMBL29323843 0.74 HSD11B1 (0.43) CA12CA1CA2CA7CA9
SCHEMBL9814426 0.74 TAS1R3 (0.44) TAS1R3TAS1R1CA12CA1CA2
SCHEMBL9814424 0.74 TAS1R3 (0.44) TAS1R3TAS1R1CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed