SCHEMBL29323853

SCHEMBL29323853

C=Cc1ccc(C(=O)OC(CS(=O)(=O)c2ccc(F)cc2)CS(=O)(=O)c2ccc(F)cc2)cc1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.39
HSD11B1 P28845 2/20 0.38
KMT2A Q03164 3/20 0.38
PAX8 Q06710 1/20 0.38
PTGS2 P35354 3/20 0.37
AKR1C2 P52895 1/20 0.37
AKR1C1 Q04828 1/20 0.37
AKR1C3 P42330 1/20 0.37
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA4 P22748 1/20 0.36
CA9 Q16790 1/20 0.36
MEN1 O00255 1/20 0.36
POLB P06746 1/20 0.35
ADRB2 P07550 1/20 0.34
ADRB1 P08588 1/20 0.34
ADRB3 P13945 1/20 0.34
MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29323852 0.89 CA2 (0.41) TDP1KMT2APTGS2CA1CA2
SCHEMBL29323813 0.87 POLB (0.40) TDP1HSD11B1CA9POLB
SCHEMBL29323843 0.87 HSD11B1 (0.43) TDP1HSD11B1AKR1C3CA1CA2
SCHEMBL29323767 0.79 KMT2A (0.44) TDP1HSD11B1KMT2APAX8PTGS2
SCHEMBL29323835 0.76 TAS1R3 (0.40) TDP1CA1CA2CA9ADRB2
SCHEMBL27618266 0.73 TNFRSF1A (0.46) HSD11B1KMT2ACA1CA2MEN1
SCHEMBL29323814 0.72 KMT2A (0.41) TDP1HSD11B1KMT2APAX8MEN1
SCHEMBL16850005 0.69 TDP1 (0.37) TDP1KMT2AADRB2ADRB1ADRB3
SCHEMBL29030380 0.69 ALDH1A1 (0.48) TDP1KMT2APOLB
SCHEMBL4378881 0.68 TAS1R3 (0.39) TDP1CA1CA2CA9ADRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed