SCHEMBL29356366

SCHEMBL29356366

CC1=C(c2cccnc2)Cc2cc(Cl)ccc21

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP11B2 P19099 12/20 0.55
CYP11B1 P15538 10/20 0.55
CYP19A1 P11511 4/20 0.55
CYP17A1 P05093 1/20 0.55
ROS1 P08922 1/20 0.41
TDP2 O95551 1/20 0.41
NPY5R Q15761 2/20 0.40
MEN1 O00255 1/20 0.40
LMNA P02545 1/20 0.40
MAPT P10636 1/20 0.40
KMT2A Q03164 1/20 0.40
KDM4E B2RXH2 1/20 0.40
NPC1 O15118 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2C19 P33261 1/20 0.40
HTT P42858 1/20 0.40
RAB9A P51151 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
ALDH1A1 P00352 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16982975 0.74 CYP2A6 (0.51) CYP11B2CYP11B1CYP19A1CYP17A1ROS1
SCHEMBL16574106 0.71 CYP2A6 (0.51) CYP11B2CYP11B1NPY5RMEN1KMT2A
SCHEMBL4514804 0.71 CYP11B1 (1.00) CYP11B2CYP11B1CYP19A1CYP17A1NPY5R
SCHEMBL17661888 0.68 CYP2A6 (0.46) CYP11B2CYP11B1CYP19A1CYP17A1ROS1
SCHEMBL16445728 0.68 MKNK1 (0.51) CYP11B2CYP11B1CYP19A1CYP17A1MAPT
SCHEMBL1606782 0.68 NPY5R (0.44) CYP11B2CYP11B1ROS1NPY5RMEN1
SCHEMBL7582709 0.67 CYP2A6 (0.53) CYP11B2CYP11B1CYP17A1NPY5RMAPT
SCHEMBL28115752 0.66 CYP2A6 (0.51) CYP11B2CYP11B1CYP17A1MEN1LMNA
Acetic Acid SCHEMBL27950053 0.66 MEN1 (0.48) CYP11B2MEN1MAPTKMT2ANPC1
SCHEMBL3946385 0.65 IDO1 (0.53) CYP11B2CYP11B1CYP17A1NPY5RMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 413 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4748483-A1 POLYTETRAFLUOROETHYLENE POROUS FILM HAVING HIGH STRENGTH AND SMALL PORE DIAMETER Chemours-Mitsui Fluoroproducts Co., Ltd (JP) 2026-05-27 EP disclosed
US-20260139361-A1 SPUTTERING TARGET MATERIAL AND SPUTTERING TARGET SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2026-05-21 US disclosed
US-12630479-B2 Sintered material, semiconductor manufacturing apparatus including the same, and method of manufacturing the sintered material SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-05-19 US disclosed
WO-2026100433-A1 β-TYPE SIALON PHOSPHOR PARTICLES デンカ株式会社 2026-05-15 WO disclosed
EP-4733065-A1 MULTILAYER FILM FOR VACUUM HEAT INSULATOR, VAPOR DEPOSITED MULTILAYER FILM FOR VACUUM HEAT INSULATOR, MULTILAYER STRUCTURE FOR VACUUM HEAT INSULATOR, VACUUM PACKAGING BAG, AND VACUUM HEAT INSULATOR Kuraray Co., Ltd. (JP) 2026-04-29 EP disclosed
US-20260100376-A1 ELECTRODE MIXTURE SHEET, ELECTRODE, SECONDARY BATTERY, AND METHOD FOR PRODUCING ELECTRODE MIXTURE SHEET DAIKIN INDUSTRIES, LTD. (JP) 2026-04-09 US disclosed
US-20260079283-A1 Strong Angular-Responses By Using Ultra-Low Refractive Index Dielectrics In Optical Devices THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) 2026-03-19 US disclosed
US-20260079395-A1 RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID DIFFUSION CONTROL AGENT TOKYO OHKA KOGYO CO LTD (JP) 2026-03-19 US disclosed
US-12577430-B2 Polishing composition containing zirconia particles and an oxidizer FUJIMI INCORPORATED (JP) 2026-03-17 US disclosed
EP-4707928-A1 COMPOSITION FOR FORMING SURFACE-MODIFIED LAYER, AND METHOD FOR FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2026-03-11 EP disclosed
CN-114258346-A Multilayer structure, vacuum packaging bag and vacuum insulator 株式会社可乐丽 2022-03-29 CN disclosed
EP-3972000-A1 PIEZOELECTRIC FILM AND PIEZOELECTRIC ELEMENT Mitsubishi Materials Corporation (JP) 2022-03-23 EP disclosed
CN-114174397-A Barium titanate fiber, resin composition and polymer composite piezoelectric body each comprising same, and method for producing barium titanate fiber 捷恩智株式会社 2022-03-11 CN disclosed
US-20220064486-A1 POLISHING COMPOSITION, CONCENTRATED LIQUID THEREOF, AND POLISHING METHOD USING THE SAME FUJIMI INCORPORATED (JP) 2022-03-03 US disclosed
US-11261299-B2 Block copolymer and method of producing the same, and method of producing structure containing phase-separated structure TOKYO OHKA KOGYO CO., LTD. (JP) 2022-03-01 US disclosed
US-11256169-B2 Resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2022-02-22 US disclosed
CN-111267287-B Process for making porous articles from alternating poly (ethylene tetrafluoroethylene) and articles made therefrom W.L.戈尔及同仁股份有限公司 2022-02-18 CN disclosed
CN-114019004-A Electrochemical detection method of gram-negative bacteria, sensor and preparation method of sensor 核工业四一六医院 2022-02-08 CN disclosed
US-20220037860-A1 CURRENT-INJECTION ORGANIC SEMICONDUCTOR LASER DIODE, METHOD FOR PRODUCING SAME AND PROGRAM KOALA TECH INC. (JP) 2022-02-03 US disclosed
US-20220025213-A1 CONCENTRATED LIQUID OF POLISHING COMPOSITION AND POLISHING METHOD USING SAME FUJIMI INCORPORATED (JP) 2022-01-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260139361-A1 SPUTTERING TARGET MATERIAL AND SPUTTERING TARGET KCNN1, KCNN2, KCNN3 CYP11B2 3817/4885CYP11B1 3672/4885CYP19A1 2031/4885
US-20260100376-A1 ELECTRODE MIXTURE SHEET, ELECTRODE, SECONDARY BATTERY, AND METHOD FOR PRODUCING ELECTRODE MIXTURE SHEET DCX, CD99, TES CYP11B2 4722/4885CYP11B1 4745/4885CYP19A1 4298/4885
US-12630479-B2 Sintered material, semiconductor manufacturing apparatus including the same, and method of manufacturing the sintered material EIF3A, EIF3C, EIF3F CYP11B2 3410/4885CYP11B1 4145/4885CYP19A1 2964/4885
US-20260079395-A1 RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID DIFFUSION CONTROL AGENT F9, AFF2, AFF1 CYP11B2 1451/4885CYP11B1 2105/4885CYP19A1 1288/4885
US-12577430-B2 Polishing composition containing zirconia particles and an oxidizer PRKCD, PRKCG, ZKSCAN2 CYP11B2 4627/4885CYP11B1 4633/4885CYP19A1 3945/4885
US-20260079283-A1 Strong Angular-Responses By Using Ultra-Low Refractive Index Dielectrics In Optical Devices MACF1, SLFN12, SRSF9 CYP11B2 4699/4885CYP11B1 4762/4885CYP19A1 3728/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.