Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 9/20 | 0.47 |
| ▸ | MEN1 | O00255 | 5/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.41 |
| ▸ | MAPT | P10636 | 5/20 | 0.41 |
| ▸ | HPGD | P15428 | 3/20 | 0.41 |
| ▸ | F2 | P00734 | 3/20 | 0.39 |
| ▸ | HTT | P42858 | 3/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | PARL | Q9H300 | 2/20 | 0.38 |
| ▸ | GBA1 | P04062 | 1/20 | 0.38 |
| ▸ | SLC22A12 | Q96S37 | 5/20 | 0.38 |
| ▸ | XBP1 | P17861 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.36 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.36 |
| ▸ | SLC22A11 | Q9NSA0 | 1/20 | 0.36 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.35 |
| ▸ | VDR | P11473 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL382760 | 1.00 | KMT2A (0.47) | KMT2AMEN1ALDH1A1KDM4EMAPT | |
| SCHEMBL29369802 | 0.84 | KDM4E (0.55) | KMT2AMEN1ALDH1A1KDM4EMAPT | |
| SCHEMBL450075 | 0.84 | KDM4E (0.55) | KMT2AMEN1ALDH1A1KDM4EMAPT | |
| SCHEMBL4831923 | 0.78 | KMT2A (0.50) | KMT2AMEN1ALDH1A1SLC22A12CYP2C9 | |
| SCHEMBL29369615 | 0.78 | PARL (0.57) | KMT2AMEN1ALDH1A1KDM4EMAPT | |
| SCHEMBL452741 | 0.78 | PARL (0.57) | KMT2AMEN1ALDH1A1KDM4EMAPT | |
| SCHEMBL27975286 | 0.78 | KMT2A (0.41) | KMT2AMEN1ALDH1A1KDM4EMAPT | |
| SCHEMBL2903856 | 0.78 | KDM4E (0.51) | KMT2AMEN1ALDH1A1KDM4EMAPT | |
| SCHEMBL461885 | 0.77 | KDM4E (0.61) | KMT2AMEN1ALDH1A1KDM4EMAPT | |
| SCHEMBL382979 | 0.77 | PTGS2 (0.41) | KMT2AMEN1ALDH1A1KDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024057999-A1 | COLORING COMPOSITION, CURED FILM, COLOR FILTER, DISPLAY DEVICE AND METHOD FOR PRODUCING CURED FILM | 富士フイルム株式会社 | 2024-03-21 | — | — | WO | disclosed |
| CN-117616337-A | Film forming material for semiconductor, member forming material for semiconductor, process member forming material for semiconductor, underlayer film forming material, underlayer film, and semiconductor device | 株式会社艾迪科 | 2024-02-27 | — | — | CN | disclosed |
| WO-2023210418-A1 | THERMOSETTING COMPOSITION, CURED PRODUCT, AND OPTICAL MEMBER | 富士フイルム株式会社 | 2023-11-02 | — | — | WO | disclosed |
| CN-110383170-B | Method for producing plated molded article | JSR株式会社 | 2023-10-03 | — | — | CN | disclosed |
| WO-2023032746-A1 | COMPOSITION, CURED FILM, STRUCTURE, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED FILM | 富士フイルム株式会社 | 2023-03-09 | — | — | WO | disclosed |
| CN-110095941-B | Photosensitive resin composition and method for producing semiconductor element | 东丽株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-114975098-A | Nanoimprint liquid material, method for producing pattern of cured product, and method for producing circuit board | 佳能株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-110819141-B | Curable composition and compound | JSR株式会社 | 2022-07-12 | — | — | CN | disclosed |
| CN-107251193-B | Nanoimprint liquid material, method for producing pattern of cured product, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2022-06-21 | — | — | CN | disclosed |
| CN-114460809-A | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-05-10 | — | — | CN | disclosed |
| CN-114341215-A | Curable composition | 株式会社日本触媒 | 2022-04-12 | — | — | CN | disclosed |
| CN-108885399-B | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-03-15 | — | — | CN | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |