SCHEMBL29370571

SCHEMBL29370571

CC(C)CC(C)(C)c1ccc2[nH]nnc2c1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
SCN10A Q9Y5Y9 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16652862 1.00 SCN10A (0.32) SCN10A
SCHEMBL1021121 0.85 SCN10A (0.35) SCN10A
SCHEMBL1023455 0.83 NPC1 (0.38)
SCHEMBL1073023 0.81 SHBG (0.41)
SCHEMBL18687266 0.80 CNR2 (0.35) SCN10A
SCHEMBL762335 0.79 KIF11 (0.41) SCN10A
SCHEMBL23069661 0.77 CYP3A4 (0.30)
SCHEMBL203467 0.75 METAP2 (0.44)
SCHEMBL6090810 0.73 LCK (0.39)
SCHEMBL7255567 0.72 ESR1 (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114364779-B Treatment liquid and method for treating object to be treated 富士胶片株式会社 2024-05-28 CN claimed
CN-114258424-B Etching composition 富士胶片电子材料美国有限公司 2023-07-04 CN claimed
CN-116218615-A Cleaning compositions and methods of use thereof 富士胶片电子材料美国有限公司 2023-06-06 CN claimed
CN-110997643-B Cleaning composition 富士胶片电子材料美国有限公司 2023-06-06 CN claimed
CN-111902379-B Cleaning composition 富士胶片电子材料美国有限公司 2023-02-17 CN claimed
CN-115044375-A Etching composition 富士胶片电子材料美国有限公司 2022-09-13 CN claimed
CN-114930505-A Treatment liquid and method for treating object to be treated 富士胶片株式会社 2022-08-19 CN claimed
EP-4029050-A1 ETCHING COMPOSITION FUJIFILM Electronic Materials U.S.A, Inc. (US) 2022-07-20 EP claimed
CN-114651317-A Etching composition 富士胶片电子材料美国有限公司 2022-06-21 CN claimed
CN-114364779-A Treatment liquid and method for treating object to be treated 富士胶片株式会社 2022-04-15 CN claimed
CN-114258424-A Etching composition 富士胶片电子材料美国有限公司 2022-03-29 CN claimed
US-20250230358-A1 COMPOSITION, METHOD FOR TREATING OBJECT TO BE TREATED, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-07-17 US disclosed
EP-4551989-A1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2025-05-14 EP disclosed
CN-115989314-B Treatment liquid and method for treating substrate 富士胶片株式会社 2025-04-15 CN disclosed
CN-118931672-A Treatment liquid, kit, method for producing treatment liquid, method for cleaning substrate, and method for treating substrate 富士胶片株式会社 2024-11-12 CN disclosed
EP-3963036-A1 ETCHING COMPOSITIONS FUJIFILM Electronic Materials U.S.A, Inc. (US) 2022-03-09 EP disclosed
CN-114144508-A Etching composition 富士胶片电子材料美国有限公司 2022-03-04 CN disclosed
WO-2022044893-A1 PROCESSING LIQUID, METHOD FOR PROCESSING SUBSTRATE 富士フイルム株式会社 2022-03-03 WO disclosed
CN-114072488-A Etching composition 富士胶片电子材料美国有限公司 2022-02-18 CN disclosed
WO-2022024609-A1 TREATMENT LIQUID AND SUBSTRATE WASHING METHOD 富士フイルム株式会社 2022-02-03 WO disclosed