SCHEMBL29375147

SCHEMBL29375147

COc1cc(N)ccc1N

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.67
CYP3A4 P08684 3/20 0.67
TSHR P16473 2/20 0.67
TDP1 Q9NUW8 2/20 0.67
HSD17B10 Q99714 1/20 0.67
MAPT P10636 4/20 0.59
GAA P10253 3/20 0.59
HTT P42858 2/20 0.59
MAPK1 P28482 1/20 0.59
KDM4E B2RXH2 3/20 0.53
ADRA2B P18089 1/20 0.52
PTGS1 P23219 1/20 0.52
APP P05067 2/20 0.52
NR4A1 P22736 1/20 0.52
USP2 O75604 1/20 0.50
LMNA P02545 1/20 0.48
POLB P06746 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
CHEK1 O14757 2/20 0.45
IDO1 P14902 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL64099 1.00 ALDH1A1 (0.67) ALDH1A1CYP3A4TSHRTDP1HSD17B10
Hydrochloric Acid SCHEMBL10782973 0.98 ALDH1A1 (0.65) ALDH1A1CYP3A4TSHRTDP1HSD17B10
Hydrochloric Acid SCHEMBL10782376 0.98 ALDH1A1 (0.65) ALDH1A1CYP3A4TSHRTDP1HSD17B10
SCHEMBL9161948 0.89 ALDH1A1 (0.55) ALDH1A1CYP3A4TSHRTDP1HSD17B10
SCHEMBL9548255 0.88 CASP1 (0.65) ALDH1A1CYP3A4TSHRTDP1HSD17B10
Methanesulfonamide SCHEMBL9482492 0.88 ALDH1A1 (0.53) ALDH1A1CYP3A4TSHRTDP1HSD17B10
Sulfuric Acid SCHEMBL29558859 0.88 ALDH1A1 (0.53) ALDH1A1CYP3A4TSHRTDP1HSD17B10
Sulfuric Acid SCHEMBL3340873 0.88 ALDH1A1 (0.53) ALDH1A1CYP3A4TSHRTDP1HSD17B10
Sulfuric Acid SCHEMBL8765503 0.86 ALDH1A1 (0.52) ALDH1A1CYP3A4TSHRTDP1HSD17B10
SCHEMBL29466928 0.84 ALDH1A1 (0.66) ALDH1A1CYP3A4TSHRTDP1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122011311-A Preparation method of metal nanocluster confined covalent organic framework composite material 西北工业大学 2026-05-12 CN claimed
CN-119303452-A Covalent organic framework membrane based on biomimetic mineralization strategy, preparation method and application of ion separation 三峡大学 2025-01-14 CN claimed
CN-122011311-A Preparation method of metal nanocluster confined covalent organic framework composite material 西北工业大学 2026-05-12 CN disclosed
CN-120154547-A Composition for dyeing hair comprising an ultra-high-efficiency aqueous multilayer emulsion system and process for its preparation 酷姆国际公司 2025-06-17 CN disclosed
CN-120154548-A Composition for dyeing hair comprising an ultra-high-efficiency aqueous multilayer emulsion system and process for its preparation 酷姆国际公司 2025-06-17 CN disclosed
CN-120051729-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学株式会社 2025-05-27 CN disclosed
CN-119816288-A Hair care compositions resulting in improved color fastness of dyed hair 帝斯曼知识产权资产管理有限公司 2025-04-11 CN disclosed
CN-119744161-A Hair dye resulting in improved color fastness of dyed hair 帝斯曼知识产权资产管理有限公司 2025-04-01 CN disclosed
CN-115894506-B Chimeric molecule and preparation method and application thereof 四川大学 2025-03-18 CN disclosed
CN-119620472-A Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element using same 日产化学株式会社 2025-03-14 CN disclosed
CN-119604810-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学株式会社 2025-03-11 CN disclosed
EP-4051219-A1 AQUEOUS OXIDIZING COMPOSITION COMPRISING AMINO ACIDS Kao Corporation (JP) 2022-09-07 EP disclosed
EP-4051228-A1 TWO-PART OXIDATIVE DYEING COMPOSITION Kao Corporation (JP) 2022-09-07 EP disclosed
CN-115023457-A (Poly) rotaxane, method for producing same, curable composition, cured product, article, and composition 株式会社ASM 2022-09-06 CN disclosed
CN-111344130-B Method for manufacturing substrate for flexible device 日产化学株式会社 2022-08-19 CN disclosed
CN-114929187-A Hair treatment agent, additive and hair treatment method 株式会社资生堂 2022-08-19 CN disclosed
CN-110554537-B Varnish for photo-alignment film and liquid crystal display device 株式会社日本显示器 2022-05-10 CN disclosed
CN-109937380-B Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element 日产化学株式会社 2022-04-19 CN disclosed
CN-110734736-B Adhesive for temporary bonding, adhesive layer, wafer processed body, and method for manufacturing semiconductor device using same 东丽株式会社 2022-04-19 CN disclosed
CN-111690321-B Varnish for photo-alignment film and liquid crystal display device 株式会社日本显示器 2022-02-08 CN disclosed