Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HIF1A | Q16665 | 3/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.39 |
| ▸ | NUDT1 | P36639 | 1/20 | 0.39 |
| ▸ | BACE1 | P56817 | 1/20 | 0.39 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.39 |
| ▸ | ADRB2 | P07550 | 3/20 | 0.38 |
| ▸ | QDPR | P09417 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 5/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 5/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.33 |
| ▸ | MTOR | P42345 | 3/20 | 0.33 |
| ▸ | LMNA | P02545 | 3/20 | 0.33 |
| ▸ | ADRB1 | P08588 | 2/20 | 0.33 |
| ▸ | ADRB3 | P13945 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36430 | 1.00 | HIF1A (0.39) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL30374860 | 1.00 | HIF1A (0.39) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL759679 | 0.89 | HSD17B10 (0.39) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL29375621 | 0.89 | HSD17B10 (0.39) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL36658 | 0.88 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1PSMB5 | |
| SCHEMBL29372915 | 0.88 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1PSMB5 | |
| SCHEMBL2864394 | 0.88 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1KDM4ELMNA | |
| SCHEMBL29499852 | 0.88 | NUDT1 (0.37) | NUDT1BACE1HSP90AA1PSMB5 | |
| SCHEMBL28462503 | 0.87 | HIF1A (0.41) | HIF1AHSD17B10NUDT1BACE1HSP90AA1 | |
| SCHEMBL2201745 | 0.86 | TRPM8 (0.42) | QDPRMAPTLMNATSHRNFKB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-119361563-A | Laminate and method for manufacturing electronic component | 东京应化工业株式会社 | 2025-01-24 | — | — | CN | disclosed |
| CN-110317174-B | Hydrogen barrier agent, composition for forming hydrogen barrier film, method for producing hydrogen barrier film, and electronic device | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118732397-A | Positive photoresist composition and method for producing resist pattern | 常州强力先端电子材料有限公司 | 2024-10-01 | — | — | CN | disclosed |
| CN-117939914-A | Structure, display element, pattern for partition wall, and method for forming the same | 东京应化工业株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-114207038-B | Resin composition, method for producing cured product, pattern cured product, interlayer insulating film, covercoat, surface protective film, and electronic component | 艾曲迪微系统股份有限公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-111205648-B | Curable composition, cured product, microlens, and optical element | 东京应化工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-111324013-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-117106358-A | Composition for forming separation layer, support substrate with separation layer, laminate, method for producing laminate, and method for producing electronic component | 东京应化工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| CN-111381438-B | Chemically amplified positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-06-20 | — | — | CN | disclosed |
| CN-106933034-B | Positive photoresist composition | 东京应化工业株式会社 | 2023-01-06 | — | — | CN | disclosed |
| CN-111217946-B | Composition comprising a compound containing a vinyl group | 东京应化工业株式会社 | 2022-12-06 | — | — | CN | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-108693710-B | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2022-12-02 | — | — | CN | disclosed |
| CN-108884574-B | Coating agent for forming metal oxide film and method for producing substrate having metal oxide film | 东京应化工业株式会社 | 2022-10-14 | — | — | CN | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-107870516-B | Positive photosensitive resin composition, patterned film and method for manufacturing bump | 奇美实业股份有限公司 | 2022-08-02 | — | — | CN | disclosed |
| CN-114207038-A | Resin composition, method for producing cured product, patterned cured product, interlayer insulating film, covercoat, surface protective film, and electronic component | 艾曲迪微系统股份有限公司 | 2022-03-18 | — | — | CN | disclosed |
| CN-106715597-B | Resin composition, method for producing heat-resistant resin film, and display device | 东丽株式会社 | 2022-03-01 | — | — | CN | disclosed |
| CN-107179652-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2022-02-08 | — | — | CN | disclosed |