SCHEMBL294387

SCHEMBL294387

CC1CC1C(=O)OC1CCCCC1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 3/20 0.44
CYP19A1 P11511 3/20 0.42
NAAA Q02083 2/20 0.41
CHRM2 P08172 2/20 0.40
CHRM4 P08173 2/20 0.40
CHRM5 P08912 2/20 0.40
CHRM1 P11229 2/20 0.40
CHRM3 P20309 2/20 0.40
HTT P42858 2/20 0.40
FABP7 O15540 1/20 0.39
FABP5 Q01469 1/20 0.39
CYP2C19 P33261 1/20 0.38
CA12 O43570 2/20 0.38
CA1 P00915 2/20 0.38
CA2 P00918 2/20 0.38
CA9 Q16790 2/20 0.38
SMN1; SMN2 Q16637 3/20 0.35
NPC1 O15118 2/20 0.35
TSHR P16473 2/20 0.35
RAB9A P51151 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2035380 0.87 EPHX1 (0.48) EPHX1CYP19A1NAAACHRM2CHRM4
SCHEMBL1297428 0.87 EPHX1 (0.48) EPHX1CYP19A1NAAACHRM2CHRM4
SCHEMBL28282345 0.86 EPHX1 (0.50) EPHX1CYP19A1NAAACHRM2CHRM4
SCHEMBL13338812 0.86 EPHX1 (0.50) EPHX1CYP19A1NAAACHRM2CHRM4
SCHEMBL5529159 0.84 EPHX1 (0.42) EPHX1CYP19A1NAAACHRM2CHRM4
SCHEMBL1296625 0.82 EPHX1 (0.48) EPHX1CYP19A1NAAACHRM2CHRM4
SCHEMBL4601423 0.82 EPHX1 (0.35) EPHX1CYP19A1NAAACHRM2CHRM4
SCHEMBL5518725 0.80 FABP7 (0.41) EPHX1CYP19A1NAAACHRM2CHRM4
SCHEMBL1297900 0.79 FABP7 (0.46) EPHX1CYP19A1NAAACHRM2CHRM4
SCHEMBL14422669 0.79 FABP7 (0.46) EPHX1CYP19A1NAAACHRM2CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1683783-B1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2012-03-14 EP disclosed
EP-1683782-B1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2012-03-14 EP disclosed
EP-1120402-B1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2008-06-25 EP disclosed
CN-1310924-C Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2007-04-18 CN disclosed
EP-1683782-A2 Chiral copper complex and production processes thereof and using the same Sumitomo Chemical Company, Limited (JP) 2006-07-26 EP disclosed
EP-1683783-A2 Chiral copper complex and production processes thereof and using the same Sumitomo Chemical Company, Limited (JP) 2006-07-26 EP disclosed
CN-1246299-C Chiral copper complex, preparation method and application thereof SUMITOMO CHEMICAL CO (JP) 2006-03-22 CN disclosed
US-7009079-B2 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-03-07 US disclosed
CN-1616465-A Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO (JP) 2005-05-18 CN disclosed
US-20050090684-A1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL CO., LTD. 2005-04-28 US disclosed
US-6670500-B2 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-12-30 US disclosed
US-6469198-B2 OBTAINED BY CONTACTING N-SALICYLIDENEAMINOALCOHOL WITH MONO OR DIVALENT COPPER COMPOUND; FORMATION OF OPTICALLY ACTIVE CYCLOPROPANE-CARBOXYLIC ESTER FROM PROCHIRAL OLEFIN AND DIAZOACETIC ACID ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-10-22 US disclosed
US-20020004618-A1 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-10 US disclosed
US-20010037036-A1 Chiral copper complex catalyst composition and asymmetric production process using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-11-01 US disclosed
CN-1313277-A Chiral copper complex, preparation method and application thereof SUMITOMO CHEMICAL CO (JP) 2001-09-19 CN disclosed
EP-1120402-A2 Chiral copper complex and production processes thereof and using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-01 EP disclosed
EP-1120401-A2 Chiral copper complex catalyst composition and asymmetric production process using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-01 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050090684-A1 Chiral copper complex and production processes thereof and using the same SOD1, CYP1A1, NFXL1 EPHX1 603/4885CYP19A1 121/4885NAAA 1453/4885
US-20010037036-A1 Chiral copper complex catalyst composition and asymmetric production process using the same AP1M1, UBA3, AP1S1 EPHX1 1268/4885CYP19A1 246/4885NAAA 577/4885
US-20020004618-A1 Chiral copper complex and production processes thereof and using the same SOD1, XDH, NFXL1 EPHX1 1392/4885CYP19A1 249/4885NAAA 1857/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.