SCHEMBL2945688

SCHEMBL2945688

CCCCO[Si](CCCc1cccc(CCl)c1)(OCCCC)OCCCC

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
LPL P06858 2/20 0.37
LIPG Q9Y5X9 2/20 0.37
CYP2D6 P10635 2/20 0.35
PPARG P37231 1/20 0.35
PPARA Q07869 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL926557 0.93 LPL (0.35) LPLLIPGCYP2D6
SCHEMBL2951759 0.93 LPL (0.35) LPLLIPGPPARGPPARA
SCHEMBL2946293 0.87 MTNR1A (0.36) LPLLIPG
SCHEMBL2955442 0.85 THRB (0.36) LPLLIPG
SCHEMBL2951754 0.84 TSHR (0.33) LPLLIPG
SCHEMBL16669416 0.83 DRD2 (0.48) LPLLIPG
SCHEMBL2955564 0.81 THRB (0.39) LPLLIPG
SCHEMBL2944739 0.80 MTNR1A (0.42)
SCHEMBL23794950 0.79 LPL (0.49) LPLLIPGPPARGPPARA
SCHEMBL30861915 0.79 LPL (0.49) LPLLIPGPPARGPPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759406-B2 Process for producing polysilsesquioxane graft polymer, pressure-sensitive adhesive, and pressure-sensitive adhesive sheet LINTEC CORPORATION (JP) 2010-07-20 US disclosed
US-20080051487-A1 Process for Producing Polysilsesquioxane Graft Polymer, Pressure-Sensitive Adhesive, and Pressure-Sensitive Adhesive Sheet LINTEC CORPORATION (JP) 2008-02-28 US disclosed