Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAP4K4 | O95819 | 2/20 | 0.57 |
| ▸ | CSNK1G2 | P78368 | 2/20 | 0.57 |
| ▸ | CLK4 | Q9HAZ1 | 2/20 | 0.57 |
| ▸ | MKNK2 | Q9HBH9 | 2/20 | 0.57 |
| ▸ | MAP4K5 | Q9Y4K4 | 2/20 | 0.57 |
| ▸ | MEN1 | O00255 | 3/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.55 |
| ▸ | MAPT | P10636 | 5/20 | 0.52 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.52 |
| ▸ | GAA | P10253 | 1/20 | 0.52 |
| ▸ | KDM1A | O60341 | 1/20 | 0.52 |
| ▸ | BRD4 | O60885 | 1/20 | 0.51 |
| ▸ | BRD2 | P25440 | 1/20 | 0.51 |
| ▸ | CREBBP | Q92793 | 1/20 | 0.51 |
| ▸ | TP53 | P04637 | 2/20 | 0.51 |
| ▸ | DHFR | P00374 | 2/20 | 0.50 |
| ▸ | NPC1 | O15118 | 1/20 | 0.50 |
| ▸ | ESR1 | P03372 | 2/20 | 0.49 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3344987 | 1.00 | MAP4K4 (0.57) | MAP4K4CSNK1G2CLK4MKNK2MAP4K5 | |
| SCHEMBL29488288 | 0.82 | MAPT (0.58) | MEN1KMT2AMAPTNPSR1GAA | |
| SCHEMBL3343178 | 0.82 | MAPT (0.58) | MEN1KMT2AMAPTNPSR1GAA | |
| SCHEMBL38651407 | 0.82 | BRD4 (0.54) | MAP4K4CSNK1G2CLK4MKNK2MAP4K5 | |
| SCHEMBL29117960 | 0.81 | KMT2A (0.65) | MEN1KMT2AMAPTNPSR1GAA | |
| SCHEMBL13046288 | 0.80 | MAP4K4 (0.52) | MAP4K4CSNK1G2CLK4MKNK2MAP4K5 | |
| SCHEMBL22282039 | 0.78 | MAP4K4 (0.60) | MAP4K4CSNK1G2CLK4MKNK2MAP4K5 | |
| SCHEMBL30937995 | 0.78 | MAP4K4 (0.60) | MAP4K4CSNK1G2CLK4MKNK2MAP4K5 | |
| SCHEMBL407605 | 0.77 | KMO (0.67) | MAP4K4CSNK1G2CLK4MKNK2MAP4K5 | |
| SCHEMBL29446517 | 0.77 | KMO (0.67) | MAP4K4CSNK1G2CLK4MKNK2MAP4K5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-120044756-A | Photosensitive resin composition | 旭化成株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-115524922-B | Photosensitive resin composition | 旭化成株式会社 | 2025-02-18 | — | — | CN | disclosed |
| CN-119148465-A | Photosensitive resin composition, photosensitive dry film and application thereof | 杭州福斯特电子材料有限公司 | 2024-12-17 | — | — | CN | disclosed |
| CN-118119565-A | Structure having micro-channel, method for manufacturing same, and micro-channel device | 旭化成株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-111527450-B | Photosensitive resin laminate and method for producing same | 旭化成株式会社 | 2023-08-08 | — | — | CN | disclosed |
| CN-111596526-B | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2023-07-25 | — | — | CN | disclosed |
| CN-115524922-A | Photosensitive resin composition | 旭化成株式会社 | 2022-12-27 | — | — | CN | disclosed |
| CN-110325913-B | Photosensitive resin composition | 旭化成株式会社 | 2022-11-01 | — | — | CN | disclosed |
| CN-114667487-A | Photosensitive resin composition and photosensitive resin laminate | 旭化成株式会社 | 2022-06-24 | — | — | CN | disclosed |
| CN-110114376-B | Curable composition, method for producing cured product, cured product thereof, and adhesive using same | 株式会社ADEKA | 2022-06-14 | — | — | CN | disclosed |
| WO-2022085366-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY | 旭化成株式会社 | 2022-04-28 | — | — | WO | disclosed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | disclosed |
| CN-114296315-A | Photosensitive resin composition | 旭化成株式会社 | 2022-04-08 | — | — | CN | disclosed |