SCHEMBL2954352

SCHEMBL2954352

COc1ccc(S(OS(=O)(=O)c2ccc(F)cc2F)(c2ccc(OC)cc2)c2ccc(OC)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 1/20 0.43
PKM P14618 1/20 0.42
SMN1; SMN2 Q16637 3/20 0.41
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
GAA P10253 1/20 0.41
ALDH1A1 P00352 2/20 0.40
TAS2R14 Q9NYV8 1/20 0.40
HSD11B1 P28845 1/20 0.40
CNR1 P21554 1/20 0.39
PTGDR Q13258 1/20 0.39
PTGDR2 Q9Y5Y4 1/20 0.39
EGFR P00533 1/20 0.39
ERBB2 P04626 1/20 0.39
LMNA P02545 1/20 0.38
HTT P42858 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
NFE2L2 Q16236 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2956300 0.95 CNR1 (0.41) FFAR4PKMSMN1; SMN2NPC1RAB9A
SCHEMBL2964612 0.85 BCHE (0.40) FFAR4SMN1; SMN2GAAALDH1A1PTGDR2
SCHEMBL2956233 0.82 PKM (0.45) PKMSMN1; SMN2NPC1RAB9AGAA
SCHEMBL2537987 0.82 HTR2A (0.41) PKMGAAALDH1A1
SCHEMBL3195325 0.82 HTR2A (0.39) FFAR4NPC1GAAALDH1A1HSD11B1
SCHEMBL2960247 0.82 PKM (0.50) FFAR4PKMSMN1; SMN2GAAALDH1A1
SCHEMBL2954165 0.81 HTR2A (0.39) SMN1; SMN2GAAALDH1A1PTGDR2HTT
SCHEMBL2957979 0.80 MMP13 (0.43) PKMSMN1; SMN2NPC1RAB9AGAA
SCHEMBL3195800 0.79 HSD11B1 (0.42) NPC1RAB9AGAAALDH1A1HSD11B1
SCHEMBL3193859 0.78 HTR2A (0.45) SMN1; SMN2GAAALDH1A1CNR1PTGDR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed