SCHEMBL4836635

SCHEMBL4836635

CCCCCCCCCCS(=O)(=O)ON1C(=O)C2CC3C(=O)N(OS(=O)(=O)CCCCCCCCCC)C(=O)C3CC2C1=O

nearest known ligand 0.37

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.37
FAAH O00519 2/20 0.35
SMPD1 P17405 2/20 0.33
CA2 P00918 1/20 0.33
ALDH1A1 P00352 1/20 0.32
MAPT P10636 1/20 0.32
RECQL P46063 2/20 0.32
GLA P06280 1/20 0.32
HPGD P15428 1/20 0.32
TSHR P16473 1/20 0.32
MAPK1 P28482 1/20 0.32
EPHX2 P34913 1/20 0.32
BLM P54132 1/20 0.32
GBA1 P04062 1/20 0.31
ALPL P05186 1/20 0.31
ALPI P09923 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4831801 1.00 PRKCA (0.37) PRKCAFAAHSMPD1CA2ALDH1A1
SCHEMBL4837159 0.94 ALDH1A1 (0.36) PRKCAALDH1A1MAPT
SCHEMBL4837295 0.85 FAAH (0.38) PRKCAFAAHSMPD1CA2RECQL
SCHEMBL4829790 0.85 FAAH (0.38) PRKCAFAAHSMPD1CA2RECQL
SCHEMBL547870 0.81 MEN1 (0.44) ALDH1A1TSHR
SCHEMBL4827156 0.79 SMN1; SMN2 (0.41) PRKCAFAAHSMPD1ALPLALPI
SCHEMBL4831764 0.79 SMN1; SMN2 (0.41) PRKCAFAAHSMPD1ALPLALPI
SCHEMBL4827145 0.79 SMN1; SMN2 (0.41) PRKCAFAAHSMPD1ALPLALPI
SCHEMBL64128 0.79 PRKCA (0.43) PRKCAFAAHCA2
SCHEMBL2955306 0.79 PRKCA (0.43) PRKCAFAAHCA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7374857-B2 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2008-05-20 US disclosed
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) 2005-02-17 US disclosed
EP-1449833-A1 BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION Wako Pure Chemical Industries, Ltd. (JP) 2004-08-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050038261-A1 Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition ASIC1, GAR1, RER1 PRKCA 898/4885FAAH 1081/4885SMPD1 4368/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.