SCHEMBL2955947

SCHEMBL2955947

CC(C)c1cc(C(C)C)c(S(=O)(=O)O[I+](c2ccc(C(C)(C)C)cc2)c2ccc(C(C)(C)C)cc2)c(C(C)C)c1[N+](=O)[O-]

nearest known ligand 0.33

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
NR1I2 O75469 3/20 0.33
MEN1 O00255 1/20 0.31
TP53 P04637 1/20 0.31
CYP3A4 P08684 1/20 0.31
MAPT P10636 1/20 0.31
TSHR P16473 1/20 0.31
NPY1R P25929 1/20 0.31
KMT2A Q03164 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2634793 0.78 FABP4 (0.42) NR1I2
SCHEMBL2955944 0.76 NR1I2 (0.32) NR1I2MEN1TP53CYP3A4MAPT
SCHEMBL27726992 0.76 FABP3 (0.36) NR1I2MEN1TP53CYP3A4MAPT
SCHEMBL5406934 0.71 HSD11B1 (0.40) MEN1MAPTKMT2ASMN1; SMN2
SCHEMBL5398592 0.70 HSD11B1 (0.47) MEN1MAPTKMT2ASMN1; SMN2
Silver SCHEMBL5376950 0.70 FABP3 (0.34) MEN1TP53CYP3A4MAPTTSHR
SCHEMBL5388305 0.70 FABP3 (0.49) MEN1TP53CYP3A4MAPTTSHR
SCHEMBL178363 0.70 FABP3 (0.49) MEN1TP53CYP3A4MAPTTSHR
SCHEMBL5416079 0.69 KMT2A (0.46) MEN1KMT2ASMN1; SMN2
SCHEMBL5376952 0.69 FABP3 (0.47) MEN1TP53CYP3A4MAPTTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-7135268-B2 Using aromatic sulfonate compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2006-11-14 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed