SCHEMBL2958397

SCHEMBL2958397

CCCCCCCCCCCCc1ccc(S(=O)(=O)O[I+](c2ccc(C(C)(C)C)cc2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
STS P08842 2/20 0.48
CA2 P00918 5/20 0.46
AKT1 P31749 7/20 0.42
SMN1; SMN2 Q16637 2/20 0.40
KCNH2 Q12809 1/20 0.40
CA1 P00915 3/20 0.39
CA9 Q16790 2/20 0.39
CA12 O43570 1/20 0.39
MOGAT2 Q3SYC2 1/20 0.39
S1PR2 O95136 1/20 0.38
S1PR1 P21453 1/20 0.38
S1PR3 Q99500 1/20 0.38
LMNA P02545 1/20 0.38
HTT P42858 1/20 0.38
CA7 P43166 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2965265 1.00 STS (0.48) STSCA2AKT1SMN1; SMN2KCNH2
SCHEMBL2966475 0.95 CA2 (0.46) STSCA2AKT1SMN1; SMN2KCNH2
SCHEMBL3759098 0.79 CA2 (0.42) CA2AKT1SMN1; SMN2KCNH2CA1
SCHEMBL5403450 0.79 CA2 (0.42) CA2CA1LMNAHTT
SCHEMBL7733596 0.79 HSD11B1 (0.43) CA2SMN1; SMN2CA1CA9CA12
SCHEMBL51291 0.77 TSHR (0.47) SMN1; SMN2LMNAHTT
SCHEMBL449583 0.77 HDAC3 (0.39) STSCA2SMN1; SMN2CA1CA9
SCHEMBL28534367 0.77 KCNH2 (0.61) STSKCNH2S1PR1S1PR3LMNA
SCHEMBL28525880 0.77 KCNH2 (0.61) STSKCNH2S1PR1S1PR3LMNA
SCHEMBL5699281 0.76 UQCRB (0.50) CA2CA1CA9LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7759045-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-07-20 US disclosed
US-20090004601-A1 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-01 US disclosed
US-6893794-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-17 US disclosed
US-20040018445-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-01-29 US disclosed
US-20030068573-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-10 US disclosed