SCHEMBL5699281

SCHEMBL5699281

CC(C)(C)c1ccc([I+](OS(=O)(=O)c2ccc(O)cc2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
UQCRB P14927 3/20 0.50
LMNA P02545 2/20 0.48
TYR P14679 1/20 0.48
HSD11B1 P28845 1/20 0.48
HSD17B3 P37058 1/20 0.48
ALDH1A1 P00352 4/20 0.42
MEN1 O00255 2/20 0.41
MAPT P10636 2/20 0.41
KMT2A Q03164 2/20 0.41
RECQL P46063 1/20 0.41
HSD17B2 P37059 3/20 0.38
ESRRG P62508 2/20 0.38
ENPP2 Q13822 1/20 0.38
ELANE P08246 1/20 0.38
CYP3A4 P08684 2/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2C19 P33261 1/20 0.37
ENPP3 O14638 2/20 0.36
ENPP1 P22413 2/20 0.36
ESR1 P03372 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL51291 0.86 TSHR (0.47) LMNAHSD11B1HSD17B3ALDH1A1MEN1
SCHEMBL2961941 0.85 HSD11B1 (0.44) LMNAHSD11B1HSD17B3ALDH1A1MEN1
SCHEMBL503481 0.85 ALDH1A1 (0.42) LMNAHSD11B1HSD17B3ALDH1A1MEN1
SCHEMBL452775 0.84 HSD11B1 (0.47) UQCRBHSD11B1HSD17B3ALDH1A1MEN1
SCHEMBL5699308 0.84 HSD11B1 (0.47) LMNAHSD11B1HSD17B3ALDH1A1MEN1
SCHEMBL4336790 0.81 KIF11 (0.49) LMNAHSD11B1HSD17B3ALDH1A1MEN1
SCHEMBL5398592 0.81 HSD11B1 (0.47) LMNAHSD11B1HSD17B3ALDH1A1MEN1
SCHEMBL3753880 0.80 ENPP3 (0.44) LMNAHSD11B1HSD17B3ALDH1A1MAPT
SCHEMBL3757628 0.80 HSD11B1 (0.41) LMNAHSD11B1HSD17B3ALDH1A1MEN1
SCHEMBL5709660 0.79 MEN1 (0.51) LMNAHSD11B1HSD17B3ALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1295177-A2 STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS Infineon Technologies North America Corp. (US) 2003-03-26 EP claimed
WO-2002001296-A2 STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS INFINEON TECHNOLOGIES NORTH AMERICA CORP. (US) 2002-01-03 WO claimed
EP-1295177-B1 STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS INFINEON TECHNOLOGIES AG (DE) 2006-08-09 EP disclosed
EP-1295177-A2 STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS Infineon Technologies North America Corp. (US) 2003-03-26 EP disclosed
US-6383715-B1 RESIST FOR ELIMINATING BLOB DEFECTS USED TO PRODUCE SEMICONDUCTOR DEFECTS WITH BASE POLYMER WITH PROTECTED GROUPS, SOLVENT AND PHOTOACID GENERATING IODINIUM SALT AND WATER SOLUBLE HYDROXYL GROUP INFINEON TECHNOLOGIES AG (DE) 2002-05-07 US disclosed
WO-2002001296-A2 STRONGLY WATER-SOLUBLE PHOTOACID GENERATOR RESIST COMPOSITIONS INFINEON TECHNOLOGIES NORTH AMERICA CORP. (US) 2002-01-03 WO disclosed