SCHEMBL29636363

SCHEMBL29636363

Cc1cc(C(c2ccc(C=O)cc2)c2cc(C)c(O)cc2C)c(C)cc1O

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TYR P14679 2/20 0.43
▸ KDM4E B2RXH2 2/20 0.39
▸ PTGS2 P35354 2/20 0.39
▸ RAB9A P51151 2/20 0.39
▸ ALDH1A1 P00352 4/20 0.38
▸ ALDH5A1 P51649 3/20 0.38
▸ ABAT P80404 3/20 0.38
▸ HPGD P15428 2/20 0.38
▸ CYP1A2 P05177 2/20 0.38
▸ CYP3A4 P08684 2/20 0.38
▸ CYP2D6 P10635 2/20 0.38
▸ MAPK1 P28482 2/20 0.38
▸ HIF1A Q16665 2/20 0.38
▸ HSD17B10 Q99714 2/20 0.38
▸ MAPT P10636 1/20 0.38
▸ G6PD P11413 1/20 0.38
▸ CYP2C9 P11712 1/20 0.38
▸ PKM P14618 1/20 0.38
▸ ALOX15 P16050 1/20 0.38
▸ ALOX12 P18054 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL283036 1.00 TYR (0.43) TYRKDM4EPTGS2RAB9AALDH1A1
SCHEMBL4063267 0.92 TYR (0.44) TYRKDM4EPTGS2RAB9AALDH1A1
SCHEMBL22039259 0.92 CYP2A6 (0.40) TYRKDM4EPTGS2RAB9AALDH1A1
SCHEMBL278561 0.86 CYP2D6 (0.50) KDM4EALDH1A1HPGDCYP1A2CYP3A4
SCHEMBL278773 0.81 CYP1A2 (0.45) TYRKDM4EALDH1A1HPGDCYP1A2
SCHEMBL21775831 0.81 ALDH1A1 (0.45) KDM4EPTGS2ALDH1A1HPGDCYP1A2
SCHEMBL12922960 0.81 KDM4E (0.45) KDM4EALDH1A1HPGDCYP1A2CYP3A4
SCHEMBL12415075 0.81 KDM4E (0.45) KDM4EALDH1A1HPGDCYP1A2CYP3A4
SCHEMBL13416158 0.80 CYP1A2 (0.43) TYRKDM4EALDH1A1HPGDCYP1A2
SCHEMBL17570365 0.80 PTGS1 (0.55) TYRKDM4EPTGS2ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120202440-A Coating agent composition for substrate containing nitrogen atom 日产化学株式会社 2025-06-24 — — CN disclosed
CN-120153321-A Composition for forming resist underlayer film 日产化学株式会社 2025-06-13 — — CN disclosed
CN-119998731-A Composition for forming resist underlayer film 日产化学株式会社 2025-05-13 — — CN disclosed
CN-119631022-A Composition for forming resist underlayer film, method for forming resist pattern using the composition, and method for manufacturing semiconductor device 日产化学株式会社 2025-03-14 — — CN disclosed
CN-114599704-B Triazine ring-containing polymer and film-forming composition containing same 日产化学株式会社 2025-02-14 — — CN disclosed
CN-119365829-A Composition for forming resist underlayer film 日产化学株式会社 2025-01-24 — — CN disclosed
CN-118974135-A Self-crosslinkable polymer and resist underlayer film forming composition 日产化学株式会社 2024-11-15 — — CN disclosed
CN-118974659-A Composition for forming resist underlayer film 日产化学株式会社 2024-11-15 — — CN disclosed
CN-114585665-B Triazine ring-containing polymer and film-forming composition containing same 日产化学株式会社 2024-11-12 — — CN disclosed
CN-117980823-A Composition for forming resist underlayer film 日产化学株式会社 2024-05-03 — — CN disclosed
CN-117597398-A Composition for pattern formation 日产化学株式会社 2024-02-23 — — CN disclosed
CN-117321141-A Solvent-free composition 日产化学株式会社 2023-12-29 — — CN disclosed
CN-117279999-A Composition for forming film 日产化学株式会社 2023-12-22 — — CN disclosed
CN-117279979-A Triazine ring-containing polymer and film-forming composition containing same 日产化学株式会社 2023-12-22 — — CN disclosed
CN-114787239-A Composition for forming pattern 日产化学株式会社 2022-07-22 — — CN disclosed
CN-114599704-A Triazine ring-containing polymer and film-forming composition containing the same 日产化学株式会社 2022-06-07 — — CN disclosed
CN-114585665-A Triazine ring-containing polymer and film-forming composition containing the same 日产化学株式会社 2022-06-03 — — CN disclosed
CN-111315800-B Triazine ring-containing polymer and composition comprising same 日产化学株式会社 2022-05-31 — — CN disclosed
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