SCHEMBL29670690

SCHEMBL29670690

Cc1ccc(C(=O)c2ccc(O)c(O)c2O)c(O)c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.55
CSNK2A1 P68400 1/20 0.48
SELL P14151 1/20 0.48
SELP P16109 1/20 0.48
TRPA1 O75762 1/20 0.48
NPC1 O15118 2/20 0.47
RAB9A P51151 2/20 0.47
TAS1R3 Q7RTX0 1/20 0.45
TAS1R1 Q7RTX1 1/20 0.45
TAS1R2 Q8TE23 1/20 0.45
ALOX15 P16050 4/20 0.44
MAPT P10636 4/20 0.44
KDM4E B2RXH2 3/20 0.44
ALDH1A1 P00352 3/20 0.44
HPGD P15428 3/20 0.44
RECQL P46063 2/20 0.44
HSD17B10 Q99714 2/20 0.44
ALOX12 P18054 2/20 0.43
MEN1 O00255 1/20 0.43
KMT2A Q03164 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL351892 1.00 HDAC1 (0.55) HDAC1CSNK2A1SELLSELPTRPA1
SCHEMBL30578000 0.88 NPC1 (0.56) CSNK2A1TRPA1NPC1RAB9ATAS1R3
SCHEMBL1758035 0.88 NPC1 (0.56) CSNK2A1TRPA1NPC1RAB9ATAS1R3
SCHEMBL8703962 0.86 HDAC1 (0.51) HDAC1CSNK2A1SELLSELPTRPA1
SCHEMBL30669864 0.83 HDAC1 (0.57) HDAC1CSNK2A1SELLSELPNPC1
SCHEMBL1063407 0.82 SELL (0.68) HDAC1SELLSELPALOX15MAPT
SCHEMBL93552 0.81 HDAC1 (0.58) HDAC1SELLSELPNPC1RAB9A
SCHEMBL14274483 0.81 NPC1 (0.54) CSNK2A1TRPA1NPC1RAB9ATAS1R3
SCHEMBL29450717 0.81 HDAC1 (0.58) HDAC1SELLSELPNPC1RAB9A
SCHEMBL11230455 0.81 CES2 (0.57) CSNK2A1NPC1RAB9ATAS1R3TAS1R1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110286561-B Radiation-sensitive composition, cured film, and display element JSR株式会社 2025-06-03 CN disclosed
CN-119805865-A Positive photoresist composition and preparation method and application thereof 上海玟昕科技有限公司 2025-04-11 CN disclosed
CN-119535891-A Photosensitive resin composition containing polysiloxane 上海玟昕科技有限公司 2025-02-28 CN disclosed
CN-115088129-B Separator for lithium secondary battery, method of manufacturing the same, and lithium secondary battery including the same 株式会社LG新能源 2024-12-31 CN disclosed
CN-115428250-B Separator for lithium secondary battery, method of manufacturing the same, and lithium secondary battery including the same 株式会社LG新能源 2024-10-22 CN disclosed
CN-117751327-A Positive photosensitive resin composition containing specific copolymer 日产化学株式会社 2024-03-22 CN disclosed
CN-117677901-A Positive photosensitive resin composition 日产化学株式会社 2024-03-08 CN disclosed
CN-117590689-A Radiation-sensitive composition, cured film, method for producing same, display device, and curable resin composition JSR株式会社 2024-02-23 CN disclosed
CN-115951558-B Photosensitive resin composition containing polysiloxane 上海玟昕科技有限公司 2023-08-04 CN disclosed
CN-108333869-B Photosensitive composition, cured film, method for producing same, and display element, light-emitting element, and light-receiving element JSR株式会社 2023-07-18 CN disclosed
CN-116107163-A Nanoparticle-containing positive photoresist composition 上海玟昕科技有限公司 2023-05-12 CN disclosed
CN-115963697-A Radiation-sensitive composition, cured film, method for producing cured film, and display device JSR株式会社 2023-04-14 CN disclosed
CN-115704996-A Radiation-sensitive composition, interlayer insulating film, method for producing same, and display element JSR株式会社 2023-02-17 CN disclosed
CN-115428250-A Separator for lithium secondary battery, method of manufacturing the same, and lithium secondary battery including the same 株式会社LG新能源 2022-12-02 CN disclosed
CN-115088129-A Separator for lithium secondary battery, method of manufacturing the same, and lithium secondary battery including the same 株式会社LG新能源 2022-09-20 CN disclosed
CN-108732831-B Resin composition, substrate and element comprising same, and method for producing same JSR株式会社 2022-08-16 CN disclosed
CN-114488688-A Liquid crystal display element, method for producing same, and radiation-sensitive resin composition JSR株式会社 2022-05-13 CN disclosed