Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 1/20 | 0.55 |
| ▸ | CSNK2A1 | P68400 | 1/20 | 0.48 |
| ▸ | SELL | P14151 | 1/20 | 0.48 |
| ▸ | SELP | P16109 | 1/20 | 0.48 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.48 |
| ▸ | NPC1 | O15118 | 2/20 | 0.47 |
| ▸ | RAB9A | P51151 | 2/20 | 0.47 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.45 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.45 |
| ▸ | TAS1R2 | Q8TE23 | 1/20 | 0.45 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.44 |
| ▸ | MAPT | P10636 | 4/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | RECQL | P46063 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29670690 | 1.00 | HDAC1 (0.55) | HDAC1CSNK2A1SELLSELPTRPA1 | |
| SCHEMBL30578000 | 0.88 | NPC1 (0.56) | CSNK2A1TRPA1NPC1RAB9ATAS1R3 | |
| SCHEMBL1758035 | 0.88 | NPC1 (0.56) | CSNK2A1TRPA1NPC1RAB9ATAS1R3 | |
| SCHEMBL8703962 | 0.86 | HDAC1 (0.51) | HDAC1CSNK2A1SELLSELPTRPA1 | |
| SCHEMBL30669864 | 0.83 | HDAC1 (0.57) | HDAC1CSNK2A1SELLSELPNPC1 | |
| SCHEMBL1063407 | 0.82 | SELL (0.68) | HDAC1SELLSELPALOX15MAPT | |
| SCHEMBL93552 | 0.81 | HDAC1 (0.58) | HDAC1SELLSELPNPC1RAB9A | |
| SCHEMBL14274483 | 0.81 | NPC1 (0.54) | CSNK2A1TRPA1NPC1RAB9ATAS1R3 | |
| SCHEMBL29450717 | 0.81 | HDAC1 (0.58) | HDAC1SELLSELPNPC1RAB9A | |
| SCHEMBL11230455 | 0.81 | CES2 (0.57) | CSNK2A1NPC1RAB9ATAS1R3TAS1R1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090030103-A1 | METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-01-29 | — | — | US | claimed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | claimed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | claimed |
| EP-4131622-B1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG ENERGY SOLUTION LTD (KR) | 2026-01-28 | — | — | EP | disclosed |
| US-12424707-B2 | Separator for lithium secondary battery, manufacturing method therefor, and lithium secondary battery comprising same | LG ENERGY SOLUTION, LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| US-12424705-B2 | Separator for lithium secondary battery, method for manufacturing same, and lithium secondary battery comprising same | LG ENERGY SOLUTION, LTD. (KR) | 2025-09-23 | — | — | US | disclosed |
| US-20230098650-A1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG ENERGY SOLUTION, LTD. (KR) | 2023-03-30 | — | — | US | disclosed |
| US-20230090568-A1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, MANUFACTURING METHOD THEREFOR, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG ENERGY SOLUTION, LTD. (KR) | 2023-03-23 | — | — | US | disclosed |
| EP-4131622-A1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, METHOD FOR MANUFACTURING SAME, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG Energy Solution, Ltd. (KR) | 2023-02-08 | — | — | EP | disclosed |
| EP-4117105-A1 | SEPARATOR FOR LITHIUM SECONDARY BATTERY, MANUFACTURING METHOD THEREFOR, AND LITHIUM SECONDARY BATTERY COMPRISING SAME | LG Energy Solution, Ltd. (KR) | 2023-01-11 | — | — | EP | disclosed |
| CN-110286561-A | Radiation sensitive compositions, cured film and display element | JSR株式会社 | 2019-09-27 | — | — | CN | disclosed |
| US-20060177767-A1 | Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO., LTD. | 2006-08-10 | — | — | US | disclosed |
| US-20050042536-A1 | Photosensitive resin composition comprising quinonediazide sulfate ester compound | DONGJIN SEMICHEM CO. LTD. (KR) | 2005-02-24 | — | — | US | disclosed |
| US-20040248030-A1 | Photosensitive resin composition for photoresist | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-12-09 | — | — | US | disclosed |
| US-6686120-B2 | THERMAL ACID GENERATOR AND A METHOD OF FORMING A PATTERN USING THE SAME. THE PHOTORESIST COMPOSITION INCLUDES ABOUT 100 PARTS BY WEIGHT OF AN ALKALI-SOLUBLE ACRYL COPOLYMER, ABOUT 5-100 PARTS BY WEIGHT OF 1,2-QUINONEDIAZIDE COMPOUND, ABOUT | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-03 | — | — | US | disclosed |
| US-20030134222-A1 | Photoresist composition and method of forming pattern using the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| WO-2003036388-A1 | PHOTOSNESITIVE RESIN COMPOSITION COMPRISING QUINONEDIAZIDE SULFATE ESTER COMPOUND | DONGJIN SEMICHEM CO., LTD. (KR) | 2003-05-01 | — | — | WO | disclosed |
| EP-0428398-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5110706-A | Photoresists for highly reflective substrates | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-05-05 | — | — | US | disclosed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | disclosed |