Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.35 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16781302 | 0.78 | CYP2C9 (0.40) | HSD11B1EPHX1 | |
| SCHEMBL2967397 | 0.74 | FDFT1 (0.38) | HSD11B1EPHX1MAPT | |
| SCHEMBL2967393 | 0.74 | FDFT1 (0.38) | HSD11B1EPHX1MAPT | |
| SCHEMBL9649905 | 0.71 | HSD11B1 (0.38) | HSD11B1MAPTEPHX2 | |
| SCHEMBL244479 | 0.71 | HSD11B1 (0.38) | HSD11B1MAPTEPHX2 | |
| SCHEMBL3961156 | 0.69 | HSD11B1 (0.44) | HSD11B1EPHX1MAPTEPHX2 | |
| SCHEMBL20768339 | 0.69 | HSD11B1 (0.44) | HSD11B1EPHX1EPHX2 | |
| SCHEMBL2300010 | 0.68 | HSD11B1 (0.43) | HSD11B1EPHX1EPHX2 | |
| SCHEMBL3753073 | 0.67 | HSD11B1 (0.50) | HSD11B1EPHX1EPHX2 | |
| SCHEMBL6329865 | 0.67 | HSD11B1 (0.39) | HSD11B1EPHX1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8741538-B2 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| EP-1736485-B1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2013-07-31 | — | — | EP | disclosed |
| US-20100151383-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-17 | — | — | US | disclosed |
| US-7700259-B2 | Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-20 | — | — | US | disclosed |
| US-20070224520-A1 | Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1736485-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-12-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070224520-A1 | Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern | ADH1A, ADH1C, POLR1A | HSD11B1 354/4885EPHX1 1507/4885MAPT 716/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.