Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LCK | P06239 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.38 |
| ▸ | PPARG | P37231 | 6/20 | 0.38 |
| ▸ | PPARA | Q07869 | 6/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.35 |
| ▸ | GSK3B | P49841 | 1/20 | 0.35 |
| ▸ | BACE1 | P56817 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13469001 | 0.87 | ADRB2 (0.35) | CYP1A2MEN1KMT2ANPC1RAB9A | |
| SCHEMBL685739 | 0.85 | PPARG (0.38) | L3MBTL1ALDH1A1TSHRPPARGPPARA | |
| SCHEMBL6780367 | 0.85 | NR1H4 (0.39) | LCKLMNAL3MBTL1ALDH1A1TSHR | |
| SCHEMBL1356988 | 0.85 | MAOB (0.46) | LCKALDH1A1RCE1MEN1KMT2A | |
| SCHEMBL6536741 | 0.85 | LMNA (0.40) | LMNAL3MBTL1PPARGPPARACYP1A2 | |
| Ethylene SCHEMBL27839738 | 0.84 | LMNA (0.41) | LMNAL3MBTL1TSHRRCE1PPARG | |
| SCHEMBL2398262 | 0.84 | TSHR (0.43) | LMNAL3MBTL1TSHRRCE1PPARG | |
| SCHEMBL6741792 | 0.82 | LMNA (0.37) | LCKLMNAL3MBTL1ALDH1A1TSHR | |
| SCHEMBL3695401 | 0.82 | ALDH1A1 (0.48) | LMNAALDH1A1TSHRCYP1A2CYP2C19 | |
| SCHEMBL4967303 | 0.81 | ABCG2 (0.40) | LMNAPPARGPPARACYP1A2CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116360211-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2023-06-30 | — | — | CN | disclosed |
| CN-115437214-A | Chemically amplified positive photosensitive resin composition, protective film, and element having protective film | 奇美实业股份有限公司 | 2022-12-06 | — | — | CN | disclosed |
| CN-113126435-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2021-07-16 | — | — | CN | disclosed |
| CN-112394618-A | Chemically amplified positive photosensitive resin composition, and protective film and member produced therefrom | 奇美实业股份有限公司 | 2021-02-23 | — | — | CN | disclosed |
| CN-111999980-A | Chemically amplified positive photosensitive resin composition, protective film and module | 奇美实业股份有限公司 | 2020-11-27 | — | — | CN | disclosed |
| CN-111381442-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2020-07-07 | — | — | CN | disclosed |
| CN-111381438-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2020-07-07 | — | — | CN | disclosed |
| CN-111324013-A | Chemically amplified positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2020-06-23 | — | — | CN | disclosed |
| EP-1158363-B1 | Positive resist composition and onium salts of saccharin derivatives | FUJIFILM CORP (JP) | 2014-01-22 | — | — | EP | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20020102491-A1 | Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) | FUJI PHOTO FILM CO., LTD. | 2002-08-01 | — | — | US | disclosed |
| EP-1199603-A9 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-07-31 | — | — | EP | disclosed |
| US-20020058200-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| EP-1199603-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-24 | — | — | EP | disclosed |
| US-20020006578-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-01-17 | — | — | US | disclosed |
| US-20010055726-A1 | Positive radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. | 2001-12-27 | — | — | US | disclosed |
| EP-1158363-A1 | Positive resist composition and onium salts of saccharin derivatives | FUJI PHOTO FILM CO., LTD. (JP) | 2001-11-28 | — | — | EP | disclosed |
| US-20010041300-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| US-20010033993-A1 | Positive-working radiation-sensitive composition | FUJIFILM CORPORATION (JP) | 2001-10-25 | — | — | US | disclosed |
| EP-1113005-A1 | Sulfonium salt compounds | Wako Pure Chemical Industries, Ltd. (JP) | 2001-07-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020102491-A1 | Comprising iodinium or sulfonium salt capable of generating a specified sulfonic acid upon irradiation and an acid decomposable resin (such as polyhydroxystyrene) | RARA, ARSA, RARB | LCK 4367/4885LMNA 2784/4885L3MBTL1 4145/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.