Water

Water

SCHEMBL297965

O.O.O.[F-].[F-].[F-].[In+3]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL7594200 1.00
Fluoride Ion SCHEMBL5792291 0.82
Fluoride Ion SCHEMBL94001 0.82
Water SCHEMBL4810354 0.67
Water SCHEMBL25293755 0.67
Water SCHEMBL23118087 0.67
Water SCHEMBL8342491 0.67
Water SCHEMBL1161000 0.67
Water SCHEMBL25293610 0.67
Water SCHEMBL3772662 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250215314-A1 PRECURSOR MATERIAL FOR SYNTHESIS OF GROUP III-V QUANTUM DOTS AND PREPARATION METHOD THEREFOR Research & Business Foundation Sungkyunkwan University (KR) 2025-07-03 US claimed
US-20240327705-A1 ZINC-DOPED QUANTUM DOT AND MANUFACTURING METHOD THEREFOR Research & Business Foundation Sungkyunkwan University (KR) 2024-10-03 US claimed
WO-2024080850-A1 PRECURSOR MATERIAL FOR SYNTHESIS OF GROUP III-V QUANTUM DOTS AND PREPARATION METHOD THEREFOR 성균관대학교산학협력단 2024-04-18 WO claimed
US-11840654-B2 Quantum dot and preparing method of the same Research & Business Foundation Sungkyunkwan University (KR) 2023-12-12 US claimed
WO-2023113353-A1 ZINC-DOPED QUANTUM DOT AND MANUFACTURING METHOD THEREFOR 성균관대학교산학협력단 2023-06-22 WO claimed
CN-114456300-B Flocculant for sand washing ore dressing and preparation method thereof 云南森博混凝土外加剂有限公司 2023-06-06 CN claimed
US-20220162501-A1 QUANTUM DOT AND PREPARING METHOD OF THE SAME Research & Business Foundation Sungkyunkwan University (KR) 2022-05-26 US claimed
CN-114456300-A Flocculant for sand washing and dressing and preparation method thereof 云南森博混凝土外加剂有限公司 2022-05-10 CN claimed
US-9353433-B2 Method of fabricating liquid for oxide thin film INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2016-05-31 US claimed
US-9123818-B2 Compositions for solution process, electronic devices fabricated using the same, and fabrication methods thereof INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2015-09-01 US claimed
US-8523996-B2 Method of fabricating liquid for oxide thin film INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2013-09-03 US claimed
US-20120080678-A1 COMPOSITIONS FOR SOLUTION PROCESS, ELECTRONIC DEVICES FABRICATED USING THE SAME, AND FABRICATION METHODS THEREOF INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2012-04-05 US claimed
EP-1631698-B1 PROCESS FOR THE PREPARATION OF METAL OXIDE COATED ORGANIC MATERIAL BY MICROWAVE DEPOSITION BASF SE (DE) 2012-03-14 EP claimed
US-7976744-B2 Applying a thin film of metal oxide dielectric onto flexible belt; defluorination using aqueous solution of fluorine scavengers; microwave radiation; separation BASF SE (DE) 2011-07-12 US claimed
US-20100251936-A1 METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM INDUSTRY-ACADEMIC COOPERATION FOUNDATION , (KR) 2010-10-07 US claimed
WO-2009054574-A1 METHOD OF FABRICATING LIQUID FOR OXIDE THIN FILM INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2009-04-30 WO claimed
US-7459182-B2 Process for the preparation of metal oxide coated organic material by microwave deposition CIBA SPECIALTY CHEMICALS CORPORATION (US) 2008-12-02 US claimed
US-20080185099-A1 Process of Using Microwave Deposition of Metal Oxide Onto an Organic Substrate CIBA CORPORATION 2008-08-07 US claimed
US-20070243337-A1 Process for producing metal oxide flakes BASF SE (DE) 2007-10-18 US claimed
US-20040265507-A1 Process for the preparation of metal oxide coated organic material by microwave deposition CIBA SPECIALTYCHEMICALS, CORP. 2004-12-30 US claimed