Sulfuric Acid

Sulfuric Acid

SCHEMBL2987166

CCN(CC)c1ccc2c(c1)N(c1ccccc1)c1cc(O)ccc1N2.O=S(=O)(O)O

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.43
CYP3A4 P08684 1/20 0.43
CYBB P04839 3/20 0.39
NOX4 Q9NPH5 3/20 0.39
HTR7 P34969 2/20 0.39
MEN1 O00255 7/20 0.38
KMT2A Q03164 7/20 0.38
GAA P10253 2/20 0.38
RAB9A P51151 2/20 0.38
GNG2 P59768 1/20 0.37
GNB1 P62873 1/20 0.37
MAPT P10636 4/20 0.36
KDM4E B2RXH2 3/20 0.36
L3MBTL1 Q9Y468 4/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
ESR1 P03372 2/20 0.34
HSD11B1 P28845 1/20 0.34
HPGD P15428 2/20 0.34
HSP90AA1 P07900 1/20 0.34
CYP2C9 P11712 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3130473 0.80 L3MBTL1 (0.42) ALDH1A1CYP3A4CYBBNOX4HTR7
SCHEMBL3903546 0.78 TSHR (0.50) ALDH1A1HTR7MEN1KMT2AGAA
Sulfuric Acid SCHEMBL944027 0.77 GNG2 (0.40) ALDH1A1CYBBNOX4MEN1KMT2A
SCHEMBL10045054 0.76 S100B (0.46) ALDH1A1CYP3A4CYBBNOX4HTR7
Sulfuric Acid SCHEMBL31536708 0.74 GNG2 (0.38) ALDH1A1CYP3A4CYBBNOX4MEN1
Hydrochloric Acid SCHEMBL29078649 0.73 TDP1 (0.43) ALDH1A1CYBBNOX4MEN1KMT2A
Hydrochloric Acid SCHEMBL30577829 0.73 TDP1 (0.43) ALDH1A1CYBBNOX4MEN1KMT2A
Sulfuric Acid SCHEMBL4920843 0.73 ALDH1A1 (0.39) ALDH1A1CYBBNOX4MEN1KMT2A
SCHEMBL4074621 0.72 GNG2 (0.49) ALDH1A1CYBBNOX4MEN1KMT2A
Sulfuric Acid SCHEMBL3336034 0.71 ALDH1A1 (0.82) ALDH1A1CYP3A4HTR7MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7786303-B2 Acidic bath for electrolytically depositing a copper deposit containing halogenated or pseudohalogenated monomeric phenazinium compounds ATOTECH DEUTSCHLAND GMBH (DE) 2010-08-31 US disclosed
EP-1720842-B1 ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS ATOTECH DEUTSCHLAND GMBH (DE) 2008-05-07 EP disclosed
US-20070108062-A1 7-Amino-2,8-dimethyl-3-thiocyanato-5-phenyl-phenazinium tetrafluooroboride; uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density; quality; high purity for decoative coatings; durable bath operation ATOTECH DEUTSCHLAND GMBH (DE) 2007-05-17 US disclosed
EP-1720842-A1 ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS ATOTECH DEUTSCHLAND GMBH (DE) 2006-11-15 EP disclosed
WO-2005049584-A1 ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS ATOTECH DEUTSCHLAND GMBH (DE) 2005-06-02 WO disclosed