Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Dichlorphenamide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 known ✓ | P00918 | 15/20 | 0.70 |
| ▸ | CA1 known ✓ | P00915 | 14/20 | 0.70 |
| ▸ | CA12 known ✓ | O43570 | 9/20 | 0.70 |
| ▸ | CA4 known ✓ | P22748 | 7/20 | 0.70 |
| ▸ | CA9 | Q16790 | 11/20 | 0.70 |
| ▸ | CA7 | P43166 | 7/20 | 0.70 |
| ▸ | CA14 | Q9ULX7 | 7/20 | 0.70 |
| ▸ | CA6 | P23280 | 6/20 | 0.70 |
| ▸ | CA5A | P35218 | 6/20 | 0.70 |
| ▸ | CA5B | Q9Y2D0 | 6/20 | 0.70 |
| ▸ | CA13 | Q8N1Q1 | 2/20 | 0.70 |
| ▸ | LMNA | P02545 | 1/20 | 0.70 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.70 |
| ▸ | MAPT | P10636 | 1/20 | 0.59 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | APEX1 | P27695 | 1/20 | 0.51 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.51 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dichlorphenamide SCHEMBL112376 | 0.83 | CA1 (1.00) | CA2CA1CA9CA12CA7 | |
| Dichlorphenamide SCHEMBL29355725 | 0.83 | CA1 (1.00) | CA2CA1CA9CA12CA7 | |
| Dichlorphenamide SCHEMBL7040074 | 0.82 | CA1 (0.96) | CA2CA1CA9CA12CA7 | |
| Dichlorphenamide SCHEMBL7034594 | 0.82 | CA1 (0.96) | CA2CA1CA9CA12CA7 | |
| Dichlorphenamide SCHEMBL4312398 | 0.82 | CA1 (0.96) | CA2CA1CA9CA12CA7 | |
| Mafenide SCHEMBL41628 | 0.78 | CA2 (1.00) | CA2CA1CA9CA12CA7 | |
| Mafenide SCHEMBL9295695 | 0.78 | CA2 (1.00) | CA2CA1CA9CA12CA7 | |
| Mafenide SCHEMBL425524 | 0.76 | CA2 (1.00) | CA2CA1CA9CA12CA7 | |
| Mafenide SCHEMBL1203324 | 0.76 | CA2 (1.00) | CA2CA1CA9CA12CA7 | |
| Mafenide SCHEMBL686407 | 0.74 | CA2 (0.95) | CA2CA1CA9CA12CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103080256-B | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | BASF SE | 2015-06-24 | — | — | CN | disclosed |
| US-20130200039-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-08-08 | — | — | US | disclosed |
| EP-2613910-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2013-07-17 | — | — | EP | disclosed |
| EP-2614122-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-07-17 | — | — | EP | disclosed |
| US-20130168348-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| US-20130171824-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| CN-103080256-A | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | BASF SE | 2013-05-01 | — | — | CN | disclosed |
| WO-2012032466-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2012-03-15 | — | — | WO | disclosed |
| WO-2012032451-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS | BASF SE (DE) | 2012-03-15 | — | — | WO | disclosed |
| WO-2012032467-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2012-03-15 | — | — | WO | disclosed |
| EP-2428541-A1 | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | BASF SE (DE) | 2012-03-14 | — | — | EP | disclosed |