Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL27454116 | 0.90 | — | — | |
| Water SCHEMBL27280625 | 0.90 | — | — | |
| Hydrochloric Acid SCHEMBL5117795 | 0.83 | — | — | |
| Fluoride SCHEMBL27278049 | 0.83 | — | — | |
| Ammonia Solution, Strong SCHEMBL27689531 | 0.83 | — | — | |
| Hydrochloric Acid SCHEMBL11026696 | 0.80 | — | — | |
| Ethane SCHEMBL11317426 | 0.80 | TSHR (0.44) | — | |
| Benzene SCHEMBL3066248 | 0.78 | — | — | |
| SCHEMBL10887154 | 0.75 | — | — | |
| Propane SCHEMBL11307246 | 0.75 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118355055-A | Isocyanate modified polyimide resin, resin composition containing the same, and cured product thereof | 日本化药株式会社 | 2024-07-16 | — | — | CN | disclosed |
| WO-2023187625-A1 | ADHESIVE-ATTACHED METAL SUBSTRATE AND LAMINATE | 藤森工業株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023187624-A1 | ADHESIVE-EQUIPPED METAL SUBSTRATE AND LAMINATE | 藤森工業株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023112849-A1 | ISOCYANATE-MODIFIED POLYIMIDE RESIN, AND RESIN COMPOSITION CONTAINING SAID ISOCYANATE-MODIFIED POLYIMIDE RESIN AND CURED PRODUCT OF SAME | 日本化薬株式会社 | 2023-06-22 | — | — | WO | disclosed |
| CN-115777003-A | Isocyanate-modified polyimide resin, resin composition, and cured product thereof | 日本化药株式会社 | 2023-03-10 | — | — | CN | disclosed |
| CN-108572514-B | Photosensitive resin composition, cured product, substrate, and article | 日本化药株式会社 | 2022-08-23 | — | — | CN | disclosed |
| WO-2022004583-A1 | ISOCYANATE-MODIFIED POLYIMIDE RESIN, RESIN COMPOSITION AND CURED PRODUCT OF SAME | 日本化薬株式会社 | 2022-01-06 | — | — | WO | disclosed |
| CN-106681104-B | Photosensitive resin composition and method for producing same, light shielding film and method for producing same, and liquid crystal display device and method for producing same | 日铁化学材料株式会社 | 2021-06-15 | — | — | CN | disclosed |
| CN-105527793-B | Photosensitive resin composition and cured product thereof | 日本化药株式会社 | 2020-07-28 | — | — | CN | disclosed |
| CN-108572514-A | Photosensitive polymer combination, hardening thing, base material and article | 日本化药株式会社 | 2018-09-25 | — | — | CN | disclosed |
| CN-106681104-A | A photosensitive resin composition, a manufacturing method thereof, a light-shielding film, a manufacturing method of the light-shielding film, a liquid crystal display and a manufacturing method of the liquid crystal display | 新日铁住金化学株式会社 | 2017-05-17 | — | — | CN | disclosed |
| CN-105527793-A | Photosensitive resin composition and hardening substance thereof | NIPPON KAYAKU KK | 2016-04-27 | — | — | CN | disclosed |
| US-7781147-B2 | Imide-urethane resin, photosensitive resin composition including the same and cured product | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2010-08-24 | — | — | US | disclosed |
| US-20090202793-A1 | Photosensitive, Aqueous Alkaline Solution-Soluble Polyimide Resin and Photosensitive Resin Composition Containing the same | NIPPON KAYAKU KABUSHIKI KAISHA | 2009-08-13 | — | — | US | disclosed |
| US-20080268373-A1 | Imide-Urethane Resin, Photosensitive Resin Composition Including the Same and Cured Product | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2008-10-30 | — | — | US | disclosed |
| CN-101268418-A | Photosensitive resin composition and cured object obtained therefrom | NIPPON KAYAKU KK (JP) | 2008-09-17 | — | — | CN | disclosed |
| US-20070161100-A1 | Photosensitive resin composition and cured product thereof | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 2007-07-12 | — | — | US | disclosed |
| EP-1715381-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED PRODUCT THEREOF | Nippon Kayaku Kabushiki Kaisha (JP) | 2006-10-25 | — | — | EP | disclosed |