SCHEMBL30045833

SCHEMBL30045833

OCCc1ccc(O)cc1O

nearest known ligand 0.77

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ TYR P14679 6/20 0.77
▸ ALOX5 P09917 2/20 0.57
▸ MEN1 O00255 1/20 0.57
▸ TP53 P04637 1/20 0.57
▸ CYP3A4 P08684 1/20 0.57
▸ MAPT P10636 1/20 0.57
▸ ALOX15 P16050 1/20 0.57
▸ TSHR P16473 1/20 0.57
▸ HTT P42858 1/20 0.57
▸ KMT2A Q03164 1/20 0.57
▸ TDP1 Q9NUW8 1/20 0.57
▸ HTR2C P28335 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL950883 1.00 TYR (0.77) TYRALOX5MEN1TP53CYP3A4
SCHEMBL1397158 0.87 TYR (1.00) TYRALOX5MEN1TP53CYP3A4
SCHEMBL532243 0.86 TYR (0.71) TYRALOX5MEN1TP53CYP3A4
SCHEMBL4370686 0.83 TYR (0.81) TYRALOX5MEN1TP53CYP3A4
SCHEMBL27903131 0.83 TYR (0.52) TYRALOX5MEN1TP53CYP3A4
SCHEMBL1846489 0.83 TYR (0.70) TYRALOX5MEN1TP53CYP3A4
SCHEMBL2767004 0.82 CHRNA7 (0.53) TYRALOX5MEN1TP53CYP3A4
SCHEMBL8401879 0.81 TYR (0.81) TYRALOX5MEN1TP53CYP3A4
SCHEMBL8401997 0.81 TYR (0.81) TYRALOX5MEN1TP53CYP3A4
SCHEMBL1467498 0.81 TYR (0.50) TYRALOX5MEN1TP53CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120136703-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 — — CN disclosed
CN-120136704-A Compound, polymer, composition for film formation, pattern formation method, method for forming insulating film, and method for producing compound 三菱瓦斯化学株式会社 2025-06-13 — — CN disclosed
US-20220348698-A1 COMPOUND, POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, PATTERN FORMATION METHOD, INSULATING FILM FORMATION METHOD, AND METHOD FOR PRODUCING COMPOUND, AS WELL AS METHOD FOR PRODUCING IODINE-CONTAINING VINYL POLYMER AND ACETYLATED DERIVATIVE THEREOF MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-11-03 — — US disclosed
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