⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29013705 | 0.79 | — | — | |
| SCHEMBL28436476 | 0.79 | CYP19A1 (0.35) | — | |
| SCHEMBL4820925 | 0.78 | TSHR (0.36) | — | |
| SCHEMBL57534 | 0.77 | TSHR (0.38) | — | |
| SCHEMBL4682825 | 0.77 | ALDH1A1 (0.34) | — | |
| SCHEMBL542103 | 0.77 | ADRA2A (0.43) | — | |
| SCHEMBL9562932 | 0.77 | PRKCA (0.31) | — | |
| SCHEMBL9146794 | 0.75 | TSHR (0.36) | — | |
| SCHEMBL1261564 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL7606323 | 0.74 | ADRA2A (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8951713-B2 | Alkali-soluble resin and negative-type photosensitive resin composition comprising the same | LG CHEM, LTD. (KR) | 2015-02-10 | — | — | US | claimed |
| US-20130130176-A1 | ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2013-05-23 | — | — | US | claimed |
| US-20100196824-A1 | ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-08-05 | — | — | US | claimed |
| WO-2009054620-A2 | ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM. LTD. (KR) | 2009-04-30 | — | — | WO | claimed |
| US-8951713-B2 | Alkali-soluble resin and negative-type photosensitive resin composition comprising the same | LG CHEM, LTD. (KR) | 2015-02-10 | — | — | US | disclosed |
| US-20130130176-A1 | ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2013-05-23 | — | — | US | disclosed |
| US-20100196824-A1 | ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-08-05 | — | — | US | disclosed |
| WO-2009054620-A2 | ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM. LTD. (KR) | 2009-04-30 | — | — | WO | disclosed |
| EP-1548039-B1 | PHOTOPOLYMERIZABLE COMPOSITION AND USE THEREOF | MITSUI CHEMICALS INC (JP) | 2008-08-13 | — | — | EP | disclosed |
| US-7307107-B2 | Photopolymerizable composition and use thereof | MITSUI CHEMICALS, INC. (JP) | 2007-12-11 | — | — | US | disclosed |
| US-20060003261-A1 | Photopolymerizable composition and use thereof | MITSUI CHEMICALS, INC. (JP) | 2006-01-05 | — | — | US | disclosed |
| EP-1548039-A1 | PHOTOPOLYMERIZABLE COMPOSITION AND USE THEREOF | Mitsui Chemicals, Inc. (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-5767212-A | RADICALLY POLYMERIZING ACRYLATE MONOMER CONTAINING SULFUR | TORAY INDUSTRIES, INC. (JP) | 1998-06-16 | — | — | US | disclosed |
| EP-0609454-B1 | PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER | TORAY INDUSTRIES (JP) | 1997-10-22 | — | — | EP | disclosed |
| EP-0609454-A1 | PROCESS FOR PRODUCING CLEAR SULFUR-CONTAINING POLYMER | TORAY INDUSTRIES, INC. (JP) | 1994-08-10 | — | — | EP | disclosed |