Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7606323 | 0.83 | ADRA2A (0.33) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL4682825 | 0.82 | ALDH1A1 (0.34) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL542103 | 0.82 | ADRA2A (0.43) | TSHRALDH1A1TP53CYP3A4MAPK1 | |
| SCHEMBL1261564 | 0.79 | ALDH1A1 (0.31) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL7027046 | 0.78 | DGKA (0.47) | TSHRCYP3A4 | |
| SCHEMBL20956274 | 0.78 | NAAA (0.47) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL28666503 | 0.78 | ALDH1A1 (0.32) | ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2 | |
| SCHEMBL3010345 | 0.78 | — | — | |
| SCHEMBL4304487 | 0.78 | ADRA2A (0.32) | — | |
| SCHEMBL538076 | 0.77 | ALDH1A1 (0.43) | TSHRHSD17B10ALDH1A1TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107001654-A | method for curing curable composition | 巴斯夫欧洲公司 | 2017-08-01 | — | — | CN | claimed |
| JP-60090217-A | — | — | None | — | — | JP | disclosed |
| US-12503552-B2 | Self-blowing isocyanate-free polyurethane foams | UNIVERSITE DE LIEGE (BE) | 2025-12-23 | — | — | US | disclosed |
| EP-4298151-B1 | NEW ANTIMICROBIAL AND ANTITHROMBOGENIC MEDICAL DEVICE | UNIV LIEGE (BE) | 2024-11-06 | — | — | EP | disclosed |
| EP-4263672-B1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | UNIV LIEGE (BE) | 2024-10-09 | — | — | EP | disclosed |
| EP-4430105-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2024-09-18 | — | — | EP | disclosed |
| US-20240139371-A1 | NEW ANTIMICROBIAL AND ANTITHROMBOGENIC MEDICAL DEVICE | UNIV LIEGE (BE) | 2024-05-02 | — | — | US | disclosed |
| US-20240043647-A1 | Self-blowing isocyanate-free polyurethane foams | Université de Liège (BE) | 2024-02-08 | — | — | US | disclosed |
| EP-4298151-A1 | NEW ANTIMICROBIAL AND ANTITHROMBOGENIC MEDICAL DEVICE | Université de Liège (BE) | 2024-01-03 | — | — | EP | disclosed |
| US-20230416487-A1 | SELF-BLOWING ISOCYANATE-FREE POLYURETHANE FOAMS | Université de Liège (BE) | 2023-12-28 | — | — | US | disclosed |
| US-6319656-B1 | FORMING FILM OF A NEGATIVE-WORKING PHOTO-SENSITIVE POLYIMIDE PRECURSOR ON A SUBSTRATE; EXPOSING FILM TO LIGHT THROUGH A MASK HAVING A PREDETERMINED PATTERN; DEVELOPING THE EXPOSED FILM USING AN ALKALINE AQUEOUS SOLUTION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2001-11-20 | — | — | US | disclosed |
| US-6218449-B1 | CONTACTING AN ELASTOMER, A FUNCTIONALISING AGENT AND OPTIONALLY, A PEROXIDE COMPOUND, THE FUNCTIONALISING AGENT BEING A THIOLCARBOXYLIC ACID POLYESTER OR A REACTION PRODUCT OF A THIOLCARBOXYLIC ACID POLYESTER WITH ETHYLENE SULFIDE | ELF ANTAR FRANCE (FR) | 2001-04-17 | — | — | US | disclosed |
| US-6200831-B1 | HEAT-CURING A COATING OF A POLYAMIC ACID BASED ON A TETRACARBOXYLIC ACID AND A DIAMINE CONTAINNG AN ACTIVE OXYGEN OR NITROGEN FUNCTIONAL GROUP; SEALING THE EXTERNAL TERMINALS WITH A RESIN, E.G. AN EPOXIDE | HITACHI, LTD. (JP) | 2001-03-13 | — | — | US | disclosed |
| US-6087006-A | SEMICONDUCTOR DEVICE HAVING SURFACE-PROTECTING FILM COMPRISING POLYIMIDE OBTAINED BY HEAT-CURING PRECURSOR HAVING POLAR SUBSTITUENTS AS THE SIDE CHAINS | HITACHI, LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| US-6025113-A | FOR PREPARING HIGHLY SENSITIVE NEGATIVE-WORKING PHOTOSENSITIVE MATERIAL DEVELOPABLE WITH ALKALINE AQUEOUS SOLUTION IN SHORT TIME WITH HIGH RESOLUTION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2000-02-15 | — | — | US | disclosed |
| EP-0814109-A1 | Photosensitive polyimide precursor and its use for pattern formation | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1997-12-29 | — | — | EP | disclosed |
| EP-0422836-B1 | Resin for urethane lenses, lenses comprising the resin, and a process for preparation of the resin and the lenses | MITSUI TOATSU CHEMICALS (JP) | 1994-08-24 | — | — | EP | disclosed |
| EP-0475086-A1 | Photo-sensitive polymer composition | HITACHI, LTD. (JP) | 1992-03-18 | — | — | EP | disclosed |
| US-5059673-A | bis(isocyanatomethyl)-norbornane or -4,7methonohexahydroindan e high refractive index, lightweight, high impact | MITSUI TOATSU CHEMICALS, INC. (JP) | 1991-10-22 | — | — | US | disclosed |
| JP-S6090217-A | EPOXY RESIN COMPOSITION FOR NEW CONSTRUCTION OR REPAIR AND APPLICATION MATERIAL CONTAINING THE SAME | DAINIPPON INK & CHEM INC | 1985-05-21 | — | — | JP | disclosed |